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Nanto, H., Minami, T., Shooji, S., Takata, S. (1984) Electrical and optical properties of zinc oxide thin films prepared by rf magnetron sputtering for transparent electrode applications. Journal of Applied Physics, 55 (4). 1029-1034 doi:10.1063/1.333196

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Reference TypeJournal (article/letter/editorial)
TitleElectrical and optical properties of zinc oxide thin films prepared by rf magnetron sputtering for transparent electrode applications
JournalJournal of Applied Physics
AuthorsNanto, H.Author
Minami, T.Author
Shooji, S.Author
Takata, S.Author
Year1984 (February 15)Volume55
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.333196Search in ResearchGate
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Mindat Ref. ID5019196Long-form Identifiermindat:1:5:5019196:7
GUID0
Full ReferenceNanto, H., Minami, T., Shooji, S., Takata, S. (1984) Electrical and optical properties of zinc oxide thin films prepared by rf magnetron sputtering for transparent electrode applications. Journal of Applied Physics, 55 (4). 1029-1034 doi:10.1063/1.333196
Plain TextNanto, H., Minami, T., Shooji, S., Takata, S. (1984) Electrical and optical properties of zinc oxide thin films prepared by rf magnetron sputtering for transparent electrode applications. Journal of Applied Physics, 55 (4). 1029-1034 doi:10.1063/1.333196
In(1984, February) Journal of Applied Physics Vol. 55 (4) AIP Publishing

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Minami, T., Nanto, H., Takata, S. (1982) Highly conductive and transparent zinc oxide films prepared by rf magnetron sputtering under an applied external magnetic field. Applied Physics Letters, 41 (10). 958-960 doi:10.1063/1.93355
Minami, Tadatsugu, Nanto, Hidehito, Takata, Shinzo (1984) Highly Conductive and Transparent Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering. Japanese Journal of Applied Physics, 23. doi:10.1143/jjap.23.l280
Nanto, H., Minami, T., Orito, S., Takata, S. (1988) Electrical and optical properties of indium tin oxide thin films prepared on low‐temperature substrates by rf magnetron sputtering under an applied external magnetic field. Journal of Applied Physics, 63 (8). 2711-2716 doi:10.1063/1.340964
Minami, Tadatsugu, Nanto, Hidehito, Takata, Shinzo (1985) Optical Properties of Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering. Japanese Journal of Applied Physics, 24. doi:10.1143/jjap.24.l605
Minami, Tadatsugu, Nanto, Hidehito, Takata, Shinzo (1985) Optical Properties of Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering. Japanese Journal of Applied Physics, 24 (10) doi:10.1143/jjap.24.l851
Minami, Tadatsugu, Sato, Hirotoshi, Nanto, Hidehito, Takata, Shinzo (1986) Highty Conductive and Transparent Silicon Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering. Japanese Journal of Applied Physics, 25. doi:10.1143/jjap.25.l776
Minami, Tadatsugu, Sato, Hirotoshi, Nanto, Hidehito, Takata, Shinzo (1985) Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering. Japanese Journal of Applied Physics, 24. doi:10.1143/jjap.24.l781
Minami, Tadatsugu, Nanto, Hidehito, Takata, Shinzo (1988) Highly Conducting and Transparent SnO2Thin Films Prepared by RF Magnetron Sputtering on Low-Temperature Substrates. Japanese Journal of Applied Physics, 27. doi:10.1143/jjap.27.l287
Schropp, R. E. I., Madan, A. (1989) Properties of conductive zinc oxide films for transparent electrode applications prepared by rf magnetron sputtering. Journal of Applied Physics, 66 (5). 2027-2031 doi:10.1063/1.344341
Minami, Tadatsugu, Sonohara, Hideo, Takata, Shinzo, Sato, Hirotoshi (1994) Highly Transparent and Conductive Zinc-Stannate Thin Films Prepared by RF Magnetron Sputtering. Japanese Journal of Applied Physics, 33. doi:10.1143/jjap.33.l1693
Minami, T., Sato, H., Ohashi, K., Tomofuji, T., Takata, S. (1992) Conduction mechanism of highly conductive and transparent zinc oxide thin films prepared by magnetron sputtering. Journal of Crystal Growth, 117 (1). 370-374 doi:10.1016/0022-0248(92)90778-h
 
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