Reference Type | Journal (article/letter/editorial) |
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Title | On the period of reflection high‐energy electron diffraction intensity oscillations during Si molecular‐beam epitaxy on vicinal Si(001) |
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Journal | Journal of Applied Physics |
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Authors | Zandvliet, H. J. W. | Author |
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Elswijk, H. B. | Author |
Dijkkamp, D. | Author |
van Loenen, E. J. | Author |
Dieleman, J. | Author |
Year | 1991 (September) | Volume | 70 |
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Issue | 5 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.349372Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 5055420 | Long-form Identifier | mindat:1:5:5055420:9 |
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GUID | 0 |
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Full Reference | Zandvliet, H. J. W., Elswijk, H. B., Dijkkamp, D., van Loenen, E. J., Dieleman, J. (1991) On the period of reflection high‐energy electron diffraction intensity oscillations during Si molecular‐beam epitaxy on vicinal Si(001). Journal of Applied Physics, 70 (5). 2614-2617 doi:10.1063/1.349372 |
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Plain Text | Zandvliet, H. J. W., Elswijk, H. B., Dijkkamp, D., van Loenen, E. J., Dieleman, J. (1991) On the period of reflection high‐energy electron diffraction intensity oscillations during Si molecular‐beam epitaxy on vicinal Si(001). Journal of Applied Physics, 70 (5). 2614-2617 doi:10.1063/1.349372 |
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In | (1991, September) Journal of Applied Physics Vol. 70 (5) AIP Publishing |
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