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Chhowalla, M., Davis, C. A., Weiler, M., Kleinsorge, B., Amaratunga, G. A. J. (1996) Stationary carbon cathodic arc: Plasma and film characterization. Journal of Applied Physics, 79 (5). 2237-2244 doi:10.1063/1.362656

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Reference TypeJournal (article/letter/editorial)
TitleStationary carbon cathodic arc: Plasma and film characterization
JournalJournal of Applied Physics
AuthorsChhowalla, M.Author
Davis, C. A.Author
Weiler, M.Author
Kleinsorge, B.Author
Amaratunga, G. A. J.Author
Year1996 (March)Volume79
Issue5
PublisherAIP Publishing
DOIdoi:10.1063/1.362656Search in ResearchGate
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Mindat Ref. ID5078839Long-form Identifiermindat:1:5:5078839:2
GUID0
Full ReferenceChhowalla, M., Davis, C. A., Weiler, M., Kleinsorge, B., Amaratunga, G. A. J. (1996) Stationary carbon cathodic arc: Plasma and film characterization. Journal of Applied Physics, 79 (5). 2237-2244 doi:10.1063/1.362656
Plain TextChhowalla, M., Davis, C. A., Weiler, M., Kleinsorge, B., Amaratunga, G. A. J. (1996) Stationary carbon cathodic arc: Plasma and film characterization. Journal of Applied Physics, 79 (5). 2237-2244 doi:10.1063/1.362656
In(1996, March) Journal of Applied Physics Vol. 79 (5) AIP Publishing

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Chhowalla, M., Weiler, M., Davis, C. A., Kleinsorge, B., Amaratunga, G. A. J. (1995) Deposition of smooth tetrahedral amorphous carbon thin films using a cathodic arc without a macroparticle filter. Applied Physics Letters, 67 (7). 894-896 doi:10.1063/1.114728
Bilek, M. M. M., Chhowalla, M., Weiler, M., Milne, W. I. (1996) Ion energy and plasma characterization in a silicon filtered cathodic vacuum arc. Journal of Applied Physics, 79 (3). 1287-1291 doi:10.1063/1.362654
Chhowalla, M., Munindradasa, A. I., Amaratunga, G. A. J. (1997) Fullerene and nanoparticle formation in carbon cathodic arc deposition. Applied Physics Letters, 70 (24). 3233-3235 doi:10.1063/1.119134
Sano, N., Wang, H., Alexandrou, I., Chhowalla, M., Teo, K. B. K., Amaratunga, G. A. J., Iimura, K. (2002) Properties of carbon onions produced by an arc discharge in water. Journal of Applied Physics, 92 (5). 2783-2788 doi:10.1063/1.1498884
Chhowalla, M., Ducati, C., Rupesinghe, N. L., Teo, K. B. K., Amaratunga, G. A. J. (2001) Field emission from short and stubby vertically aligned carbon nanotubes. Applied Physics Letters, 79 (13). 2079-2081 doi:10.1063/1.1406557
Bell, M. S., Lacerda, R. G., Teo, K. B. K., Rupesinghe, N. L., Amaratunga, G. A. J., Milne, W. I., Chhowalla, M. (2004) Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes. Applied Physics Letters, 85 (7). 1137-1139 doi:10.1063/1.1782256
Chhowalla, M., Yin, Y., Amaratunga, G. A. J., McKenzie, D. R., Frauenheim, Th. (1996) Highly tetrahedral amorphous carbon films with low stress. Applied Physics Letters, 69 (16). 2344-2346 doi:10.1063/1.117519
Ducati, C., Alexandrou, I., Chhowalla, M., Robertson, J., Amaratunga, G. A. J. (2004) The role of the catalytic particle in the growth of carbon nanotubes by plasma enhanced chemical vapor deposition. Journal of Applied Physics, 95 (11). 6387-6391 doi:10.1063/1.1728293
Hofmann, S., Cantoro, M., Kleinsorge, B., Casiraghi, C., Parvez, A., Robertson, J., Ducati, C. (2005) Effects of catalyst film thickness on plasma-enhanced carbon nanotube growth. Journal of Applied Physics, 98 (3). 34308pp. doi:10.1063/1.1989432
Teo, K. B. K., Chhowalla, M., Amaratunga, G. A. J., Milne, W. I., Hasko, D. G., Pirio, G., Legagneux, P., Wyczisk, F., Pribat, D. (2001) Uniform patterned growth of carbon nanotubes without surface carbon. Applied Physics Letters, 79 (10). 1534-1536 doi:10.1063/1.1400085
Chhowalla, M., Teo, K. B. K., Ducati, C., Rupesinghe, N. L., Amaratunga, G. A. J., Ferrari, A. C., Roy, D., Robertson, J., Milne, W. I. (2001) Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition. Journal of Applied Physics, 90 (10). 5308-5317 doi:10.1063/1.1410322
 
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