Parry, C. P., Whall, T. E., Parker, E. H. C. (1997) Structural and electrical properties of p+n junctions in Si by low energy Ga+ implantation. Journal of Applied Physics, 82 (10). 4990-4993 doi:10.1063/1.366367
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Structural and electrical properties of p+n junctions in Si by low energy Ga+ implantation | ||
Journal | Journal of Applied Physics | ||
Authors | Parry, C. P. | Author | |
Whall, T. E. | Author | ||
Parker, E. H. C. | Author | ||
Year | 1997 (November 15) | Volume | 82 |
Issue | 10 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.366367Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 5087337 | Long-form Identifier | mindat:1:5:5087337:1 |
GUID | 0 | ||
Full Reference | Parry, C. P., Whall, T. E., Parker, E. H. C. (1997) Structural and electrical properties of p+n junctions in Si by low energy Ga+ implantation. Journal of Applied Physics, 82 (10). 4990-4993 doi:10.1063/1.366367 | ||
Plain Text | Parry, C. P., Whall, T. E., Parker, E. H. C. (1997) Structural and electrical properties of p+n junctions in Si by low energy Ga+ implantation. Journal of Applied Physics, 82 (10). 4990-4993 doi:10.1063/1.366367 | ||
In | (1997, November) Journal of Applied Physics Vol. 82 (10) AIP Publishing |
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