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Liu, A. G., Wang, X. F., Tang, B. Y., Chu, P. K. (1998) Dose and energy uniformity over inner surface in plasma immersion ion implantation. Journal of Applied Physics, 84 (4). 1859-1862 doi:10.1063/1.368344

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Reference TypeJournal (article/letter/editorial)
TitleDose and energy uniformity over inner surface in plasma immersion ion implantation
JournalJournal of Applied Physics
AuthorsLiu, A. G.Author
Wang, X. F.Author
Tang, B. Y.Author
Chu, P. K.Author
Year1998 (August 15)Volume84
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.368344Search in ResearchGate
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Mindat Ref. ID5093181Long-form Identifiermindat:1:5:5093181:5
GUID0
Full ReferenceLiu, A. G., Wang, X. F., Tang, B. Y., Chu, P. K. (1998) Dose and energy uniformity over inner surface in plasma immersion ion implantation. Journal of Applied Physics, 84 (4). 1859-1862 doi:10.1063/1.368344
Plain TextLiu, A. G., Wang, X. F., Tang, B. Y., Chu, P. K. (1998) Dose and energy uniformity over inner surface in plasma immersion ion implantation. Journal of Applied Physics, 84 (4). 1859-1862 doi:10.1063/1.368344
In(1998, August) Journal of Applied Physics Vol. 84 (4) AIP Publishing

See Also

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Zeng, Z. M., Kwok, T. K., Tian, X. B., Tang, B. Y., Chu, P. K. (1999) Investigation of dose uniformity on the inner races of bearings treated by plasma immersion ion implantation. Journal of Applied Physics, 86 (1). 120-123 doi:10.1063/1.370708
Zeng, X. C., Kwok, T. K., Liu, A. G., Chu, P. K., Tang, B. Y. (1998) Plasma immersion ion implantation of the interior surface of a large cylindrical bore using an auxiliary electrode. Journal of Applied Physics, 83 (1). 44-49 doi:10.1063/1.366699
Lu, Qiu Yuan, Li, Liu He, Li, Jian Hui, Fu, Ricky K. Y., Chu, Paul K. (2009) Impact energy and retained dose uniformity in enhanced glow discharge plasma immersion ion implantation. Applied Physics Letters, 95 (6). 61503pp. doi:10.1063/1.3204697
Li, Liuhe, Li, Jianhui, Kwok, Dixon T. K., Wang, Zhuo, Chu, Paul K. (2009) Plasma sheath physics and dose uniformity in enhanced glow discharge plasma immersion ion implantation and deposition. Journal of Applied Physics, 106 (1). 13313pp. doi:10.1063/1.3160309
Liu, A. G., Wang, X. F., Tang, B. Y., Chu, P. K., Ko, P. K., Cheng, Y. C. (1998) A novel distributed system for plasma immersion ion implanter control and automation. Review of Scientific Instruments, 69 (3). 1495-1498 doi:10.1063/1.1148785
Zeng, X. C., Kwok, T. K., Liu, A. G., Chu, P. K., Tang, B. Y., Sheridan, T. E. (1997) Effects of the auxiliary electrode radius during plasma immersion ion implantation of a small cylindrical bore. Applied Physics Letters, 71 (8). 1035-1037 doi:10.1063/1.119719
Fan, Zhineng, Chu, Paul K., Chan, Chung, Cheung, Nathan W. (1998) Sample stage induced dose and energy nonuniformity in plasma immersion ion implantation of silicon. Applied Physics Letters, 73 (2). 202-204 doi:10.1063/1.121755
Wang, L. P., Gan, K. Y., Tian, X. B., Tang, B. Y., Chu, P. K. (2000) Characteristics and design of metal vacuum arc plasma source power supply for pulsed-mode plasma immersion ion implantation. Review of Scientific Instruments, 71 (12). 4435pp. doi:10.1063/1.1327312
Tian, X. B., Kwok, D. T. K., Chu, Paul. K. (2000) Modeling of incident particle energy distribution in plasma immersion ion implantation. Journal of Applied Physics, 88 (9). 4961-4966 doi:10.1063/1.1319163
Zhang, T., Tang, B. Y., Zeng, Z. M., Kwok, T. K., Chu, P. K., Monteiro, O. R., Brown, I. G. (1999) Pure high dose metal ion implantation using the plasma immersion technique. Review of Scientific Instruments, 70 (11). 4359-4361 doi:10.1063/1.1150094
Tian, X. B., Chu, Paul. K. (2002) Multiple ion-focusing effects in plasma immersion ion implantation. Applied Physics Letters, 81 (20). 3744-3746 doi:10.1063/1.1520716
 
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