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Liu, J. F., Feng, J. Y., Zhu, J. (2001) Comparison of the thermal stability of NiSi films in Ni/Pt/(111)Si and Ni/Pt/(100)Si systems. Journal of Applied Physics, 90 (2). 745-749 doi:10.1063/1.1379053

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Reference TypeJournal (article/letter/editorial)
TitleComparison of the thermal stability of NiSi films in Ni/Pt/(111)Si and Ni/Pt/(100)Si systems
JournalJournal of Applied Physics
AuthorsLiu, J. F.Author
Feng, J. Y.Author
Zhu, J.Author
Year2001 (July 15)Volume90
Issue2
PublisherAIP Publishing
DOIdoi:10.1063/1.1379053Search in ResearchGate
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Mindat Ref. ID5109713Long-form Identifiermindat:1:5:5109713:6
GUID0
Full ReferenceLiu, J. F., Feng, J. Y., Zhu, J. (2001) Comparison of the thermal stability of NiSi films in Ni/Pt/(111)Si and Ni/Pt/(100)Si systems. Journal of Applied Physics, 90 (2). 745-749 doi:10.1063/1.1379053
Plain TextLiu, J. F., Feng, J. Y., Zhu, J. (2001) Comparison of the thermal stability of NiSi films in Ni/Pt/(111)Si and Ni/Pt/(100)Si systems. Journal of Applied Physics, 90 (2). 745-749 doi:10.1063/1.1379053
In(2001, July) Journal of Applied Physics Vol. 90 (2) AIP Publishing

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Wang, R N, Feng, J Y (2003) Comparison of the thermal stabilities of NiSi films in Ni/Si, Ni/Pd/Si and Ni/Pt/Si systems. Journal of Physics: Condensed Matter, 15 (12). 1935-1942 doi:10.1088/0953-8984/15/12/310
Liu, J. F., Feng, J. Y., Zhu, J. (2002) Film thickness dependence of the NiSi-to-NiSi2 transition temperature in the Ni/Pt/Si(100) system. Applied Physics Letters, 80 (2). 270-272 doi:10.1063/1.1434311
Mangelinck, D., Dai, J. Y., Pan, J. S., Lahiri, S. K. (1999) Enhancement of thermal stability of NiSi films on (100)Si and (111)Si by Pt addition. Applied Physics Letters, 75 (12). 1736-1738 doi:10.1063/1.124803
Liu, J. F., Chen, H. B., Feng, J. Y., Zhu, J. (2000) Improvement of the thermal stability of NiSi films by using a thin Pt interlayer. Applied Physics Letters, 77 (14). 2177-2179 doi:10.1063/1.1313815
Manandhar, Sudha, Kelber, Jeffry (2008) Effects of molecular versus atomic oxygen on NiSi and Ni(Pt)Si films grown on both p- and n-doped Si(100). Applied Physics Letters, 92 (15). 154106pp. doi:10.1063/1.2909574
Wang, R.N., Feng, J.Y., Huang, Y. (2003) Mechanism about improvement of NiSi thermal stability for Ni/Pt/Si(1 1 1) bi-layered system. Applied Surface Science, 207. 139-143 doi:10.1016/s0169-4332(02)01327-2
Liu, J.F, Chen, H.B, Feng, J.Y (2000) Enhanced thermal stability of NiSi films on Si(111) substrates by a thin Pt interlayer. Journal of Crystal Growth, 220 (4). 488-493 doi:10.1016/s0022-0248(00)00891-5
Jiang, Zuimin, Jiang, Xiaoming, Liu, Wenhan, Wu, Ziqin (1989) Thermal stability of multilayer films Pt/Si, W/Si, Mo/Si, and W/C. Journal of Applied Physics, 65 (1). 196-200 doi:10.1063/1.342569
Nave, Sven, Tiwari, Ashwani Kumar, Jackson, Bret (2010) Methane dissociation and adsorption on Ni(111), Pt(111), Ni(100), Pt(100), and Pt(110)-(1×2): Energetic study. The Journal of Chemical Physics, 132 (5). 54705pp. doi:10.1063/1.3297885
Yu, J., Sun, J. L., Meng, X. J., Huang, Z. M., Chu, J. H., Tang, D. Y., Jin, C. Y., Li, G., Li, W. Y., Liang, Q. (2001) Ultraviolet-infrared optical properties of highly (100)-oriented LaNiO3 thin films on Pt–Ti–SiO2–Si wafer. Journal of Applied Physics, 90 (6). 2699-2702 doi:10.1063/1.1394903
Duan, Zhiyao, Wang, Guofeng (2013) Comparison of Reaction Energetics for Oxygen Reduction Reactions on Pt(100), Pt(111), Pt/Ni(100), and Pt/Ni(111) Surfaces: A First-Principles Study. The Journal of Physical Chemistry C, 117 (12). 6284-6292 doi:10.1021/jp400388v
 
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