Reference Type | Journal (article/letter/editorial) |
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Title | Film thickness dependence of the NiSi-to-NiSi2 transition temperature in the Ni/Pt/Si(100) system |
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Journal | Applied Physics Letters |
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Authors | Liu, J. F. | Author |
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Feng, J. Y. | Author |
Zhu, J. | Author |
Year | 2002 (January 14) | Volume | 80 |
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Issue | 2 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.1434311Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 8532018 | Long-form Identifier | mindat:1:5:8532018:1 |
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GUID | 0 |
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Full Reference | Liu, J. F., Feng, J. Y., Zhu, J. (2002) Film thickness dependence of the NiSi-to-NiSi2 transition temperature in the Ni/Pt/Si(100) system. Applied Physics Letters, 80 (2). 270-272 doi:10.1063/1.1434311 |
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Plain Text | Liu, J. F., Feng, J. Y., Zhu, J. (2002) Film thickness dependence of the NiSi-to-NiSi2 transition temperature in the Ni/Pt/Si(100) system. Applied Physics Letters, 80 (2). 270-272 doi:10.1063/1.1434311 |
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In | (2002, January) Applied Physics Letters Vol. 80 (2) AIP Publishing |
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