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Zhang, J. F., Zhao, C. Z., Groeseneken, G., Degraeve, R., Ellis, J. N., Beech, C. D. (2001) Hydrogen induced positive charge generation in gate oxides. Journal of Applied Physics, 90 (4). 1911-1919 doi:10.1063/1.1384860

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Reference TypeJournal (article/letter/editorial)
TitleHydrogen induced positive charge generation in gate oxides
JournalJournal of Applied Physics
AuthorsZhang, J. F.Author
Zhao, C. Z.Author
Groeseneken, G.Author
Degraeve, R.Author
Ellis, J. N.Author
Beech, C. D.Author
Year2001 (August 15)Volume90
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.1384860Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5110068Long-form Identifiermindat:1:5:5110068:9
GUID0
Full ReferenceZhang, J. F., Zhao, C. Z., Groeseneken, G., Degraeve, R., Ellis, J. N., Beech, C. D. (2001) Hydrogen induced positive charge generation in gate oxides. Journal of Applied Physics, 90 (4). 1911-1919 doi:10.1063/1.1384860
Plain TextZhang, J. F., Zhao, C. Z., Groeseneken, G., Degraeve, R., Ellis, J. N., Beech, C. D. (2001) Hydrogen induced positive charge generation in gate oxides. Journal of Applied Physics, 90 (4). 1911-1919 doi:10.1063/1.1384860
In(2001, August) Journal of Applied Physics Vol. 90 (4) AIP Publishing

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