Tajima, J., Kubota, Y., Togashi, R., Murakami, H., Kumagai, Y., Koukitu, A. (2008) Growth of thin protective AlN layers on sapphire substrates at 1065 °C for hydride vapor phase epitaxy of AlN above 1300 °C. physica status solidi (c), 5 (6). 1515-1517 doi:10.1002/pssc.200778433
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Growth of thin protective AlN layers on sapphire substrates at 1065 °C for hydride vapor phase epitaxy of AlN above 1300 °C | ||
Journal | physica status solidi (c) | ||
Authors | Tajima, J. | Author | |
Kubota, Y. | Author | ||
Togashi, R. | Author | ||
Murakami, H. | Author | ||
Kumagai, Y. | Author | ||
Koukitu, A. | Author | ||
Year | 2008 (May) | Volume | 5 |
Issue | 6 | ||
Publisher | Wiley | ||
DOI | doi:10.1002/pssc.200778433Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 5116053 | Long-form Identifier | mindat:1:5:5116053:9 |
GUID | 0 | ||
Full Reference | Tajima, J., Kubota, Y., Togashi, R., Murakami, H., Kumagai, Y., Koukitu, A. (2008) Growth of thin protective AlN layers on sapphire substrates at 1065 °C for hydride vapor phase epitaxy of AlN above 1300 °C. physica status solidi (c), 5 (6). 1515-1517 doi:10.1002/pssc.200778433 | ||
Plain Text | Tajima, J., Kubota, Y., Togashi, R., Murakami, H., Kumagai, Y., Koukitu, A. (2008) Growth of thin protective AlN layers on sapphire substrates at 1065 °C for hydride vapor phase epitaxy of AlN above 1300 °C. physica status solidi (c), 5 (6). 1515-1517 doi:10.1002/pssc.200778433 | ||
In | (2008, May) physica status solidi (c) Vol. 5 (6) Wiley |
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