Vote for your favorite mineral in #MinCup25! - Cuprosklodowskite vs. Ikaite
It's radioactive #cuprosklodowskite vs ephemeral #ikaite for today's match.
Log InRegister
Quick Links : The Mindat ManualThe Rock H. Currier Digital LibraryMindat Newsletter [Free Download]
Home PageAbout MindatThe Mindat ManualHistory of MindatCopyright StatusWho We AreContact UsAdvertise on Mindat
Donate to MindatCorporate SponsorshipSponsor a PageSponsored PagesMindat AdvertisersAdvertise on Mindat
Learning CenterWhat is a mineral?The most common minerals on earthInformation for EducatorsMindat ArticlesThe ElementsThe Rock H. Currier Digital LibraryGeologic Time
Minerals by PropertiesMinerals by ChemistryAdvanced Locality SearchRandom MineralRandom LocalitySearch by minIDLocalities Near MeSearch ArticlesSearch GlossaryMore Search Options
Search For:
Mineral Name:
Locality Name:
Keyword(s):
 
The Mindat ManualAdd a New PhotoRate PhotosLocality Edit ReportCoordinate Completion ReportAdd Glossary Item
Mining CompaniesStatisticsUsersMineral MuseumsClubs & OrganizationsMineral Shows & EventsThe Mindat DirectoryDevice SettingsThe Mineral Quiz
Photo SearchPhoto GalleriesSearch by ColorNew Photos TodayNew Photos YesterdayMembers' Photo GalleriesPast Photo of the Day GalleryPhotography

Teii, Kungen, Hori, Masaru, Goto, Toshio (2002) Ion-to-CH3 flux ratio in diamond chemical-vapor deposition. Journal of Applied Physics, 92 (7). 4103-4108 doi:10.1063/1.1506384

Advanced
   -   Only viewable:
Reference TypeJournal (article/letter/editorial)
TitleIon-to-CH3 flux ratio in diamond chemical-vapor deposition
JournalJournal of Applied Physics
AuthorsTeii, KungenAuthor
Hori, MasaruAuthor
Goto, ToshioAuthor
Year2002 (October)Volume92
Issue7
PublisherAIP Publishing
DOIdoi:10.1063/1.1506384Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5116959Long-form Identifiermindat:1:5:5116959:4
GUID0
Full ReferenceTeii, Kungen, Hori, Masaru, Goto, Toshio (2002) Ion-to-CH3 flux ratio in diamond chemical-vapor deposition. Journal of Applied Physics, 92 (7). 4103-4108 doi:10.1063/1.1506384
Plain TextTeii, Kungen, Hori, Masaru, Goto, Toshio (2002) Ion-to-CH3 flux ratio in diamond chemical-vapor deposition. Journal of Applied Physics, 92 (7). 4103-4108 doi:10.1063/1.1506384
In(2002, October) Journal of Applied Physics Vol. 92 (7) AIP Publishing

See Also

These are possibly similar items as determined by title/reference text matching only.

Teii, Kungen, Hori, Masaru, Goto, Toshio (2001) Dual-electrode biasing for controlling ion-to-adatom flux ratio during ion-assisted deposition of diamond. Journal of Applied Physics, 89 (9). 4714-4718 doi:10.1063/1.1359159
Teii, Kungen, Hori, Masaru, Goto, Toshio (2004) Diagnostic and analytical study on a low-pressure limit of diamond chemical vapor deposition in inductively coupled CO–CH4–H2 plasmas. Journal of Applied Physics, 95 (8). 4463-4470 doi:10.1063/1.1686900
Teii, Kungen, Ito, Haruhiko, Hori, Masaru, Takeo, Takashi, Goto, Toshio (2000) Kinetics and role of C, O, and OH in low-pressure nanocrystalline diamond growth. Journal of Applied Physics, 87 (9). 4572-4579 doi:10.1063/1.373104
Teii, Kungen, Hori, Masaru, Goto, Toshio, Ishii, Nobuo (2000) Precursors of fluorocarbon film growth studied by mass spectrometry. Journal of Applied Physics, 87 (10). 7185-7190 doi:10.1063/1.372967
Ito, Haruhiko, Teii, Kungen, Ishikawa, Masayuki, Ito, Masafumi, Hori, Masaru, Takeo, Takashi, Kato, Terumasa, Goto, Toshio (1999) Diamond Deposition and Behavior of Atomic Carbon Species in a Low-Pressure Inductively Coupled Plasma. Japanese Journal of Applied Physics, 38. 4504-4507 doi:10.1143/jjap.38.4504
Ito, Haruhiko, Teii, Kungen, Funakoshi, Hikaru, Hori, Masaru, Goto, Toshio, Ito, Masafumi, Takeo, Takashi (2000) Loss kinetics of carbon atoms in low-pressure high density plasmas. Journal of Applied Physics, 88 (8). 4537pp. doi:10.1063/1.1314307
Teii, Kungen (1999) Independent control of ion energy and flux in plasma-enhanced diamond growth. Applied Physics Letters, 74 (26). 4067-4069 doi:10.1063/1.123263
Teii, Kungen (2001) Soft ion impact for surface activation during diamond chemical-vapor deposition on diamond and silicon. Physical Review B, 64 (12) doi:10.1103/physrevb.64.125327
Ikeda, Masanobu, Hori, Masaru, Goto, Toshio, Inayoshi, Muneto, KojiYamada, , Hiramatsu, Mineo, MasahitoNawata, (1995) Synthesis of Diamond Using RF Magnetron Methanol Plasma Chemical Vapor Deposition Assisted by Hydrogen Radical Injection. Japanese Journal of Applied Physics, 34. 2484-2488 doi:10.1143/jjap.34.2484
Tada, Shigekazu, Ito, Masafumi, Hamagaki, Manabu, Hori, Masaru, Goto, Toshio (2002) Deposition of Diamond-Like Carbon Using Compact Electron-Beam-Excited Plasma Source. Japanese Journal of Applied Physics, 41. 5408-5414 doi:10.1143/jjap.41.5408
Ohta, Hiroyuki, Hori, Masaru, Goto, Toshio (2001) Ultrathin fluorinated silicon nitride gate dielectric films formed by remote plasma enhanced chemical vapor deposition employing NH3 and SiF4. Journal of Applied Physics, 90 (4). 1955-1961 doi:10.1063/1.1381556
 
and/or  
Mindat.org is an outreach project of the Hudson Institute of Mineralogy, a 501(c)(3) not-for-profit organization.
Copyright © mindat.org and the Hudson Institute of Mineralogy 1993-2025, except where stated. Most political location boundaries are © OpenStreetMap contributors. Mindat.org relies on the contributions of thousands of members and supporters. Founded in 2000 by Jolyon Ralph.
To cite: Ralph, J., Von Bargen, D., Martynov, P., Zhang, J., Que, X., Prabhu, A., Morrison, S. M., Li, W., Chen, W., & Ma, X. (2025). Mindat.org: The open access mineralogy database to accelerate data-intensive geoscience research. American Mineralogist, 110(6), 833–844. doi:10.2138/am-2024-9486.
Privacy Policy - Terms & Conditions - Contact Us / DMCA issues - Report a bug/vulnerability Current server date and time: September 14, 2025 21:14:10
Go to top of page