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Hagelaar, G. J. M., Hassouni, K., Gicquel, A. (2004) Interaction between the electromagnetic fields and the plasma in a microwave plasma reactor. Journal of Applied Physics, 96 (4). 1819-1828 doi:10.1063/1.1769607

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Reference TypeJournal (article/letter/editorial)
TitleInteraction between the electromagnetic fields and the plasma in a microwave plasma reactor
JournalJournal of Applied Physics
AuthorsHagelaar, G. J. M.Author
Hassouni, K.Author
Gicquel, A.Author
Year2004 (August 15)Volume96
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.1769607Search in ResearchGate
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Mindat Ref. ID5128787Long-form Identifiermindat:1:5:5128787:2
GUID0
Full ReferenceHagelaar, G. J. M., Hassouni, K., Gicquel, A. (2004) Interaction between the electromagnetic fields and the plasma in a microwave plasma reactor. Journal of Applied Physics, 96 (4). 1819-1828 doi:10.1063/1.1769607
Plain TextHagelaar, G. J. M., Hassouni, K., Gicquel, A. (2004) Interaction between the electromagnetic fields and the plasma in a microwave plasma reactor. Journal of Applied Physics, 96 (4). 1819-1828 doi:10.1063/1.1769607
In(2004, August) Journal of Applied Physics Vol. 96 (4) AIP Publishing

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Gordon, M. H., Duten, X., Hassouni, K., Gicquel, A. (2001) Energy coupling efficiency of a hydrogen microwave plasma reactor. Journal of Applied Physics, 89 (3). 1544pp. doi:10.1063/1.1337593
Hassouni, K., Grotjohn, T. A., Gicquel, A. (1999) Self-consistent microwave field and plasma discharge simulations for a moderate pressure hydrogen discharge reactor. Journal of Applied Physics, 86 (1). 134-151 doi:10.1063/1.370710
Lombardi, G., Hassouni, K., Bénédic, F., Mohasseb, F., Röpcke, J., Gicquel, A. (2004) Spectroscopic diagnostics and modeling of Ar∕H2∕CH4 microwave discharges used for nanocrystalline diamond deposition. Journal of Applied Physics, 96 (11). 6739-6751 doi:10.1063/1.1814174
Mesbahi, A, Silva, F, Farhat, S, Hassouni, K, Bonnin, X, Gicquel, A (2013) Hydrodynamics effects in high power density microwave plasma diamond growth reactors. Journal of Physics D: Applied Physics, 46. 385502pp. doi:10.1088/0022-3727/46/38/385502
Derkaoui, N., Rond, C., Hassouni, K., Gicquel, A. (2014) Spectroscopic analysis of H2/CH4microwave plasma and fast growth rate of diamond single crystal. Journal of Applied Physics, 115 (23). 233301pp. doi:10.1063/1.4883955
Lombardi, G., Hassouni, K., Stancu, G.-D., Mechold, L., Röpcke, J., Gicquel, A. (2005) Modeling of microwave discharges of H2 admixed with CH4 for diamond deposition. Journal of Applied Physics, 98 (5). 53303pp. doi:10.1063/1.2034646
Gicquel, A., Chenevier, M., Hassouni, Kh., Tserepi, A., Dubus, M. (1998) Validation of actinometry for estimating relative hydrogen atom densities and electron energy evolution in plasma assisted diamond deposition reactors. Journal of Applied Physics, 83 (12). 7504-7521 doi:10.1063/1.367514
Silva, F, Hassouni, K, Bonnin, X, Gicquel, A (2009) Microwave engineering of plasma-assisted CVD reactors for diamond deposition. Journal of Physics: Condensed Matter, 21 (36). 364202pp. doi:10.1088/0953-8984/21/36/364202
Hagelaar, G. J. M., Klein, M. H., Snijkers, R. J. M. M., Kroesen, G. M. W. (2001) Energy loss mechanisms in the microdischarges in plasma display panels. Journal of Applied Physics, 89 (4). 2033-2039 doi:10.1063/1.1337084
Hagelaar, G J M, Makasheva, K, Garrigues, L, Boeuf, J-P (2009) Modelling of a dipolar microwave plasma sustained by electron cyclotron resonance. Journal of Physics D: Applied Physics, 42. 194019pp. doi:10.1088/0022-3727/42/19/194019
Hassouni, K., Gicquel, A., Capitelli, M. (1998) The role of dissociative attachment from Rydberg states in enhancing H− concentration in moderate- and low-pressure H2 plasma sources. Chemical Physics Letters, 290. 502-508 doi:10.1016/s0009-2614(98)00562-4
 
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