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Derkaoui, N., Rond, C., Hassouni, K., Gicquel, A. (2014) Spectroscopic analysis of H2/CH4microwave plasma and fast growth rate of diamond single crystal. Journal of Applied Physics, 115 (23). 233301pp. doi:10.1063/1.4883955

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Reference TypeJournal (article/letter/editorial)
TitleSpectroscopic analysis of H2/CH4microwave plasma and fast growth rate of diamond single crystal
JournalJournal of Applied Physics
AuthorsDerkaoui, N.Author
Rond, C.Author
Hassouni, K.Author
Gicquel, A.Author
Year2014 (June 21)Volume115
Issue23
PublisherAIP Publishing
DOIdoi:10.1063/1.4883955Search in ResearchGate
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Mindat Ref. ID5197895Long-form Identifiermindat:1:5:5197895:6
GUID0
Full ReferenceDerkaoui, N., Rond, C., Hassouni, K., Gicquel, A. (2014) Spectroscopic analysis of H2/CH4microwave plasma and fast growth rate of diamond single crystal. Journal of Applied Physics, 115 (23). 233301pp. doi:10.1063/1.4883955
Plain TextDerkaoui, N., Rond, C., Hassouni, K., Gicquel, A. (2014) Spectroscopic analysis of H2/CH4microwave plasma and fast growth rate of diamond single crystal. Journal of Applied Physics, 115 (23). 233301pp. doi:10.1063/1.4883955
In(2014, June) Journal of Applied Physics Vol. 115 (23) AIP Publishing

See Also

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Derkaoui, N, Rond, C, Gries, T, Henrion, G, Gicquel, A (2014) Determining electron temperature and electron density in moderate pressure H2/CH4microwave plasma. Journal of Physics D: Applied Physics, 47. 205201pp. doi:10.1088/0022-3727/47/20/205201
Gicquel, A., Derkaoui, N., Rond, C., Benedic, F., Cicala, G., Moneger, D., Hassouni, K. (2012) Quantitative analysis of diamond deposition reactor efficiency. Chemical Physics, 398. 239-247 doi:10.1016/j.chemphys.2011.08.022
Rond, C., Hamann, S., Wartel, M., Lombardi, G., Gicquel, A., Röpcke, J. (2014) Infrared spectroscopic and modeling studies of H2/CH4 microwave plasma gas phase from low to high pressure and power. Journal of Applied Physics, 116 (9). 93301pp. doi:10.1063/1.4894778
Lombardi, G., Hassouni, K., Bénédic, F., Mohasseb, F., Röpcke, J., Gicquel, A. (2004) Spectroscopic diagnostics and modeling of Ar∕H2∕CH4 microwave discharges used for nanocrystalline diamond deposition. Journal of Applied Physics, 96 (11). 6739-6751 doi:10.1063/1.1814174
Bruno, P, Bénédic, F, Mohasseb, F, Lombardi, G, Silva, F, Hassouni, K (2004) Improvement of nanocrystalline diamond film growth process using pulsed Ar/H2/CH4microwave discharges. Journal of Physics D: Applied Physics, 37. doi:10.1088/0022-3727/37/22/l01
Lombardi, G., Hassouni, K., Stancu, G.-D., Mechold, L., Röpcke, J., Gicquel, A. (2005) Modeling of microwave discharges of H2 admixed with CH4 for diamond deposition. Journal of Applied Physics, 98 (5). 53303pp. doi:10.1063/1.2034646
Achard, J, Silva, F, Tallaire, A, Bonnin, X, Lombardi, G, Hassouni, K, Gicquel, A (2007) High quality MPACVD diamond single crystal growth: high microwave power density regime. Journal of Physics D: Applied Physics, 40. 6175-6188 doi:10.1088/0022-3727/40/20/s04
Farhat, S., Findeling, C., Silva, F., Hassouni, K., Gicquel, A. (1998) Role of the plasma composition at the surface on diamond growth. Le Journal de Physique IV, 8. doi:10.1051/jp4:1998734
Mesbahi, A, Silva, F, Farhat, S, Hassouni, K, Bonnin, X, Gicquel, A (2013) Hydrodynamics effects in high power density microwave plasma diamond growth reactors. Journal of Physics D: Applied Physics, 46. 385502pp. doi:10.1088/0022-3727/46/38/385502
Hagelaar, G. J. M., Hassouni, K., Gicquel, A. (2004) Interaction between the electromagnetic fields and the plasma in a microwave plasma reactor. Journal of Applied Physics, 96 (4). 1819-1828 doi:10.1063/1.1769607
Gordon, M. H., Duten, X., Hassouni, K., Gicquel, A. (2001) Energy coupling efficiency of a hydrogen microwave plasma reactor. Journal of Applied Physics, 89 (3). 1544pp. doi:10.1063/1.1337593
 
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