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Hwang, Sang-Soo, Jung, Sung-Yup, Joo, Young-Chang (2008) Characteristics of leakage current in the dielectric layer due to Cu migration during bias temperature stress. Journal of Applied Physics, 104 (4). 44511pp. doi:10.1063/1.2973154

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Reference TypeJournal (article/letter/editorial)
TitleCharacteristics of leakage current in the dielectric layer due to Cu migration during bias temperature stress
JournalJournal of Applied Physics
AuthorsHwang, Sang-SooAuthor
Jung, Sung-YupAuthor
Joo, Young-ChangAuthor
Year2008 (August 15)Volume104
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.2973154Search in ResearchGate
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Mindat Ref. ID5159356Long-form Identifiermindat:1:5:5159356:0
GUID0
Full ReferenceHwang, Sang-Soo, Jung, Sung-Yup, Joo, Young-Chang (2008) Characteristics of leakage current in the dielectric layer due to Cu migration during bias temperature stress. Journal of Applied Physics, 104 (4). 44511pp. doi:10.1063/1.2973154
Plain TextHwang, Sang-Soo, Jung, Sung-Yup, Joo, Young-Chang (2008) Characteristics of leakage current in the dielectric layer due to Cu migration during bias temperature stress. Journal of Applied Physics, 104 (4). 44511pp. doi:10.1063/1.2973154
In(2008, August) Journal of Applied Physics Vol. 104 (4) AIP Publishing

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Hwang, Sang-Soo, Jung, Sung-Yup, Joo, Young-Chang (2007) The electric field dependence of Cu migration induced dielectric failure in interlayer dielectric for integrated circuits. Journal of Applied Physics, 101 (7). 74501pp. doi:10.1063/1.2714668
Joo, Young Chang, Hwang, Soo Jung, Park, Hyun (2003) The Effect of Grain Boundary Characteristics on Microstructure and Stress Void Evolution in Electroplated and Sputtered Cu Films. Materials Science Forum, 426. 3481-3486 doi:10.4028/www.scientific.net/msf.426-432.3481
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Samanta, Piyas, Mandal, Krishna C. (2017) Leakage current conduction, hole injection, and time-dependent dielectric breakdown ofn-4H-SiC MOS capacitors during positive bias temperature stress. Journal of Applied Physics, 121 (3). 34501pp. doi:10.1063/1.4973674
Hwang, Sang-Soo, Lee, Hee-Chan, Ro, Hyun Wook, Yoon, Do Yeung, Joo, Young-Chang (2005) Effect of pore interconnection on Cu-diffusion-induced failures in porous spin-on low-k dielectrics. Applied Physics Letters, 87 (11). 111915pp. doi:10.1063/1.2048822
Joo, Young Chang, Hwang, Soo Jung (2007) Effect of Film Thickness and Annealing Temperature in Stress-Induced Damage in Metal Films. Materials Science Forum, 539. 3520-3524 doi:10.4028/www.scientific.net/msf.539-543.3520
Woo, Jong-Chang, Chun, Yoon-Soo, Joo, Young-Hee, Kim, Chang-Il (2012) Low leakage current in metal-insulator-metal capacitors of structural Al2O3/TiO2/Al2O3 dielectrics. Applied Physics Letters, 100 (8). 81101pp. doi:10.1063/1.3687702
Hwang, Soo Jung, Koike, Junichi, Joo, Young Chang (2005) Evolution of Stress-Induced Surface Damage and Stress-Relaxation of Electroplated Cu Films at Elevated Temperatures. Materials Science Forum, 475. 3641-3646 doi:10.4028/www.scientific.net/msf.475-479.3641
Yim, Jung-Ryoul, Jung, Sung-Yup, Yeon, Han-Wool, Kwon, Jang-Yoen, Lee, Young-Joo, Lee, Je-Hun, Joo, Young-Chang (2012) Erratum: “Effects of Metal Electrode on the Electrical Performance of Amorphous In–Ga–Zn–O Thin Film Transistor”. Japanese Journal of Applied Physics, 51. 29201 doi:10.1143/jjap.51.029201
Yim, Jung-Ryoul, Jung, Sung-Yup, Yeon, Han-Wool, Kwon, Jang-Yoen, Lee, Young-Joo, Lee, Je-Hun, Joo, Young-Chang (2012) Effects of Metal Electrode on the Electrical Performance of Amorphous In–Ga–Zn–O Thin Film Transistor. Japanese Journal of Applied Physics, 51 (1) 11401 doi:10.1143/jjap.51.011401
Yim, Jung-Ryoul, Jung, Sung-Yup, Yeon, Han-Wool, Kwon, Jang-Yoen, Lee, Young-Joo, Lee, Je-Hun, Joo, Young-Chang (2012) Effects of Metal Electrode on the Electrical Performance of Amorphous In–Ga–Zn–O Thin Film Transistor. Japanese Journal of Applied Physics, 51 (1) 11401 doi:10.7567/jjap.51.011401
 
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