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Kimura, Takashi, Kasugai, Hiroki (2010) Properties of inductively coupled rf Ar/H2 plasmas: Experiment and global model. Journal of Applied Physics, 107 (8). 83308pp. doi:10.1063/1.3345084

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Reference TypeJournal (article/letter/editorial)
TitleProperties of inductively coupled rf Ar/H2 plasmas: Experiment and global model
JournalJournal of Applied Physics
AuthorsKimura, TakashiAuthor
Kasugai, HirokiAuthor
Year2010 (April 15)Volume107
Issue8
PublisherAIP Publishing
DOIdoi:10.1063/1.3345084Search in ResearchGate
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Mindat Ref. ID5173225Long-form Identifiermindat:1:5:5173225:7
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Full ReferenceKimura, Takashi, Kasugai, Hiroki (2010) Properties of inductively coupled rf Ar/H2 plasmas: Experiment and global model. Journal of Applied Physics, 107 (8). 83308pp. doi:10.1063/1.3345084
Plain TextKimura, Takashi, Kasugai, Hiroki (2010) Properties of inductively coupled rf Ar/H2 plasmas: Experiment and global model. Journal of Applied Physics, 107 (8). 83308pp. doi:10.1063/1.3345084
In(2010, April) Journal of Applied Physics Vol. 107 (8) AIP Publishing

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Kimura, Takashi, Kasugai, Hiroki (2010) Experiments and global model of inductively coupled rf Ar/N2 discharges. Journal of Applied Physics, 108 (3). 33305pp. doi:10.1063/1.3468603
Kimura, Takashi, Kasugai, Hiroki (2012) Properties of Inductively Coupled Radio Frequency CH$_{4}$/H$_{2}$ Plasmas: Experiments and Global Model. Japanese Journal of Applied Physics, 51. 46202 doi:10.1143/jjap.51.046202
Kimura, Takashi, Kasugai, Hiroki (2012) Properties of Inductively Coupled Radio Frequency CH4/H2Plasmas: Experiments and Global Model. Japanese Journal of Applied Physics, 51 (4) 46202 doi:10.7567/jjap.51.046202
Kimura, T., Ohe, K. (2001) Global model of inductively coupled Ar plasmas using two-temperature approximation. Journal of Applied Physics, 89 (8). 4240-4246 doi:10.1063/1.1354652
Kimura, Takashi, Hanaki, Katsuyuki (2008) Experiments and Global Model Analysis of Inductively Coupled CF4/O2/Ar Plasmas. Japanese Journal of Applied Physics, 47 (11) 8537-8545 doi:10.1143/jjap.47.8537
Draghici, M., Stamate, E. (2010) Properties and etching rates of negative ions in inductively coupled plasmas and dc discharges produced in Ar/SF6. Journal of Applied Physics, 107 (12). 123304pp. doi:10.1063/1.3452357
Kimura, Takashi, Noto, Masahisa (2006) Experimental study and global model of inductively coupled CF4βˆ•O2 discharges. Journal of Applied Physics, 100 (6). 63303pp. doi:10.1063/1.2345461
Sode, M., Schwarz-Selinger, T., Jacob, W. (2013) Quantitative determination of mass-resolved ion densities in H2-Ar inductively coupled radio frequency plasmas. Journal of Applied Physics, 113 (9). 93304pp. doi:10.1063/1.4794165
Kimura, Takashi, Hanaki, Katsuyuki (2008) Probe Measurements and Optical Emission Spectroscopy in Inductively Coupled Ar/CF4, Ar/NF3, and Ar/SF6Discharges. Japanese Journal of Applied Physics, 47 (11) 8546-8552 doi:10.1143/jjap.47.8546
Kimura, Takashi, Hanaki, Katsuyuki (2009) Comparison of Plasma Parameters Measured in Inductively Coupled Ar/C4F8/O2and Ar/CF4/O2Plasmas. Japanese Journal of Applied Physics, 48 (9) 96004 doi:10.1143/jjap.48.096004
Lee, Hyo-Chang, Chung, Chin-Wook, Kim, J. H., Seong, D. J. (2019) Electron energy distribution modification by RF bias in Ar/SF6 inductively coupled plasmas. Applied Physics Letters, 115 (6). 64102pp. doi:10.1063/1.5110219
 
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