Kumar, Yogesh, Choudhary, R. J., Kumar, Ravi (2012) Strain controlled systematic variation of metal-insulator transition in epitaxial NdNiO3 thin films. Journal of Applied Physics, 112 (7). 73718pp. doi:10.1063/1.4758306
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Strain controlled systematic variation of metal-insulator transition in epitaxial NdNiO3 thin films | ||
Journal | Journal of Applied Physics | ||
Authors | Kumar, Yogesh | Author | |
Choudhary, R. J. | Author | ||
Kumar, Ravi | Author | ||
Year | 2012 (October) | Volume | 112 |
Issue | 7 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.4758306Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 5191285 | Long-form Identifier | mindat:1:5:5191285:3 |
GUID | 0 | ||
Full Reference | Kumar, Yogesh, Choudhary, R. J., Kumar, Ravi (2012) Strain controlled systematic variation of metal-insulator transition in epitaxial NdNiO3 thin films. Journal of Applied Physics, 112 (7). 73718pp. doi:10.1063/1.4758306 | ||
Plain Text | Kumar, Yogesh, Choudhary, R. J., Kumar, Ravi (2012) Strain controlled systematic variation of metal-insulator transition in epitaxial NdNiO3 thin films. Journal of Applied Physics, 112 (7). 73718pp. doi:10.1063/1.4758306 | ||
In | (2012, October) Journal of Applied Physics Vol. 112 (7) AIP Publishing |
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