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Milosavljević, Vladimir, MacGearailt, Niall, Cullen, P. J., Daniels, Stephen, Turner, Miles M. (2013) Phase-resolved optical emission spectroscopy for an electron cyclotron resonance etcher. Journal of Applied Physics, 113 (16). 163302pp. doi:10.1063/1.4802440

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Reference TypeJournal (article/letter/editorial)
TitlePhase-resolved optical emission spectroscopy for an electron cyclotron resonance etcher
JournalJournal of Applied Physics
AuthorsMilosavljević, VladimirAuthor
MacGearailt, NiallAuthor
Cullen, P. J.Author
Daniels, StephenAuthor
Turner, Miles M.Author
Year2013 (April 28)Volume113
Issue16
PublisherAIP Publishing
DOIdoi:10.1063/1.4802440Search in ResearchGate
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Mindat Ref. ID5192183Long-form Identifiermindat:1:5:5192183:3
GUID0
Full ReferenceMilosavljević, Vladimir, MacGearailt, Niall, Cullen, P. J., Daniels, Stephen, Turner, Miles M. (2013) Phase-resolved optical emission spectroscopy for an electron cyclotron resonance etcher. Journal of Applied Physics, 113 (16). 163302pp. doi:10.1063/1.4802440
Plain TextMilosavljević, Vladimir, MacGearailt, Niall, Cullen, P. J., Daniels, Stephen, Turner, Miles M. (2013) Phase-resolved optical emission spectroscopy for an electron cyclotron resonance etcher. Journal of Applied Physics, 113 (16). 163302pp. doi:10.1063/1.4802440
In(2013, April) Journal of Applied Physics Vol. 113 (16) AIP Publishing

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Milosavljević, V., Cullen, P. J. (2015) Spatial phase-resolved optical emission spectroscopy for understanding plasma etching uniformity. EPL (Europhysics Letters), 110. 43001pp. doi:10.1209/0295-5075/110/43001
Cismaru, C., Shohet, J. L. (1999) Plasma vacuum ultraviolet emission in an electron cyclotron resonance etcher. Applied Physics Letters, 74 (18). 2599-2601 doi:10.1063/1.123909
Rhoades, R. L., Gorbatkin, S. M. (1996) Characterization of Ar/Cu electron‐cyclotron‐resonance plasmas using optical emission spectroscopy. Journal of Applied Physics, 80 (5). 2605-2613 doi:10.1063/1.363177
Sprangle, P., Tang, C. M., Serafim, P. (1986) Induced resonance electron cyclotron quasi‐optical maser in an open resonator. Applied Physics Letters, 49 (18). 1154-1156 doi:10.1063/1.97451
Booth, J. P., Sadeghi, N. (1991) Oxygen and fluorine atom kinetics in electron cyclotron resonance plasmas by time‐resolved actinometry. Journal of Applied Physics, 70 (2). 611-620 doi:10.1063/1.349662
Schlottmann, P. (2013) Electron spin resonance in CeB6. Journal of Applied Physics, 113 (17). 2147483647pp. doi:10.1063/1.4793776
Milosavljević, Vladimir, Donegan, Mick, Cullen, Patrick J., Dowling, Denis P. (2014) Diagnostics of an O2–He RF Atmospheric Plasma Discharge by Spectral Emission. Journal of the Physical Society of Japan, 83 (1). 14501pp. doi:10.7566/jpsj.83.014501
Donnelly, V. M., Schabel, M. J. (2002) Spatially resolved electron temperatures, species concentrations, and electron energy distributions in inductively coupled chlorine plasmas, measured by trace-rare gases optical emission spectroscopy. Journal of Applied Physics, 91 (10). 6288pp. doi:10.1063/1.1467398
Karakas, Erdinc, Donnelly, Vincent M., Economou, Demetre J. (2013) Optical emission spectroscopy and Langmuir probe diagnostics of CH3F/O2 inductively coupled plasmas. Journal of Applied Physics, 113 (21). 213301pp. doi:10.1063/1.4807298
Yao, X. Z., Jiang, D. Y. (1997) Effect of secondary electron emission on sheath potential in an electron cyclotron resonance plasma. Journal of Applied Physics, 81 (5). 2119-2123 doi:10.1063/1.364264
Ahmad, R. U., Nagy, G., Osgood, R. M., Turner, G. W., Manfra, M. J., Chludzinski, J. W. (2000) Electron cyclotron resonance plasma etching of GaSb-based alloys. Applied Physics Letters, 77 (7). 1008pp. doi:10.1063/1.1289058
 
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