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Nakamura, Yoshiaki, Sugimoto, Ryota, Ishibe, Takafumi, Matsui, Hideki, Kikkawa, Jun, Sakai, Akira (2014) Control of epitaxial growth of Fe-based nanocrystals on Si substrates using well-controlled nanometer-sized interface. Journal of Applied Physics, 115 (4). 44301pp. doi:10.1063/1.4862642

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Reference TypeJournal (article/letter/editorial)
TitleControl of epitaxial growth of Fe-based nanocrystals on Si substrates using well-controlled nanometer-sized interface
JournalJournal of Applied Physics
AuthorsNakamura, YoshiakiAuthor
Sugimoto, RyotaAuthor
Ishibe, TakafumiAuthor
Matsui, HidekiAuthor
Kikkawa, JunAuthor
Sakai, AkiraAuthor
Year2014 (January 28)Volume115
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.4862642Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5198132Long-form Identifiermindat:1:5:5198132:1
GUID0
Full ReferenceNakamura, Yoshiaki, Sugimoto, Ryota, Ishibe, Takafumi, Matsui, Hideki, Kikkawa, Jun, Sakai, Akira (2014) Control of epitaxial growth of Fe-based nanocrystals on Si substrates using well-controlled nanometer-sized interface. Journal of Applied Physics, 115 (4). 44301pp. doi:10.1063/1.4862642
Plain TextNakamura, Yoshiaki, Sugimoto, Ryota, Ishibe, Takafumi, Matsui, Hideki, Kikkawa, Jun, Sakai, Akira (2014) Control of epitaxial growth of Fe-based nanocrystals on Si substrates using well-controlled nanometer-sized interface. Journal of Applied Physics, 115 (4). 44301pp. doi:10.1063/1.4862642
In(2014, January) Journal of Applied Physics Vol. 115 (4) AIP Publishing

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Matsui, Hideki, Ishibe, Takafumi, Terada, Tsukasa, Sakane, Shunya, Watanabe, Kentaro, Takeuchi, Shotaro, Sakai, Akira, Kimura, Shigeru, Nakamura, Yoshiaki (2018) Resistive switching characteristics of isolated core-shell iron oxide/germanium nanocrystals epitaxially grown on Si substrates. Applied Physics Letters, 112 (3). 31601pp. doi:10.1063/1.5013349
Ishibe, Takafumi, Watanabe, Kentaro, Nakamura, Yoshiaki (2016) Effect of Fe coating of nucleation sites on epitaxial growth of Fe oxide nanocrystals on Si substrates. Japanese Journal of Applied Physics, 55 (8) 8 doi:10.7567/jjap.55.08nb12
Ishibe, Takafumi, Uematsu, Yuto, Naruse, Nobuyasu, Mera, Yutaka, Nakamura, Yoshiaki (2020) Impact of metal silicide nanocrystals on the resistance ratio in resistive switching of epitaxial Fe3O4 films on Si substrates. Applied Physics Letters, 116 (18) 181601pp. doi:10.1063/1.5143960
Terada, Tsukasa, Ishibe, Takafumi, Watanabe, Kentaro, Nakamura, Yoshiaki (2018) Growth of epitaxial FeGeγ nanocrystals with incommensurate Nowotny chimney-ladder phase on Si substrate. Japanese Journal of Applied Physics, 57 (8) 8 doi:10.7567/jjap.57.08nb01
Tanaka, Kazuki, Nakamura, Yoshiaki, Yamasaka, Shuto, Kikkawa, Jun, Sakai, Takenobu, Sakai, Akira (2015) Formation and optical properties of Ge films grown on Si(111) substrates using nanocontact epitaxy. Applied Surface Science, 325. 170-174 doi:10.1016/j.apsusc.2014.11.033
Yoshitake, Osamu, Kikkawa, Jun, Nakamura, Yoshiaki, Toyoda, Eiji, Isogai, Hiromichi, Izunome, Koji, Sakai, Akira (2011) Annealing Effects on Ge/SiO2Interface Structure in Wafer-Bonded Germanium-on-Insulator Substrates. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.1143/jjap.50.04da13
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Takahashi, Masahiko, Nakamura, Yoshiaki, Kikkawa, Jun, Nakatsuka, Osamu, Zaima, Shigeaki, Sakai, Akira (2011) Structural Analysis of Si-Based Nanodot Arrays Self-Organized by Selective Etching of SiGe/Si Films. Japanese Journal of Applied Physics, 50 (8) 8 doi:10.1143/jjap.50.08lb11
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Nakamura, Yoshiaki, Takahashi, Masahiko, Fujiwara, Tatsuki, Kikkawa, Jun, Sakai, Akira, Nakatsuka, Osamu, Zaima, Shigeaki (2011) Self-organization of two-dimensional SiGe nanodot arrays using selective etching of pure-edge dislocation network. Journal of Applied Physics, 109 (4). 44301 doi:10.1063/1.3549158
 
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