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Tanaka, Kazuki, Nakamura, Yoshiaki, Yamasaka, Shuto, Kikkawa, Jun, Sakai, Takenobu, Sakai, Akira (2015) Formation and optical properties of Ge films grown on Si(111) substrates using nanocontact epitaxy. Applied Surface Science, 325. 170-174 doi:10.1016/j.apsusc.2014.11.033

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Reference TypeJournal (article/letter/editorial)
TitleFormation and optical properties of Ge films grown on Si(111) substrates using nanocontact epitaxy
JournalApplied Surface Science
AuthorsTanaka, KazukiAuthor
Nakamura, YoshiakiAuthor
Yamasaka, ShutoAuthor
Kikkawa, JunAuthor
Sakai, TakenobuAuthor
Sakai, AkiraAuthor
Year2015 (January)Volume325
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2014.11.033Search in ResearchGate
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Mindat Ref. ID9924461Long-form Identifiermindat:1:5:9924461:1
GUID0
Full ReferenceTanaka, Kazuki, Nakamura, Yoshiaki, Yamasaka, Shuto, Kikkawa, Jun, Sakai, Takenobu, Sakai, Akira (2015) Formation and optical properties of Ge films grown on Si(111) substrates using nanocontact epitaxy. Applied Surface Science, 325. 170-174 doi:10.1016/j.apsusc.2014.11.033
Plain TextTanaka, Kazuki, Nakamura, Yoshiaki, Yamasaka, Shuto, Kikkawa, Jun, Sakai, Takenobu, Sakai, Akira (2015) Formation and optical properties of Ge films grown on Si(111) substrates using nanocontact epitaxy. Applied Surface Science, 325. 170-174 doi:10.1016/j.apsusc.2014.11.033
In(n.d.) Applied Surface Science Vol. 325. Elsevier BV

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