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Gao, A., Lee, C. J., Bijkerk, F. (2014) Graphene defect formation by extreme ultraviolet generated photoelectrons. Journal of Applied Physics, 116 (5). 54312pp. doi:10.1063/1.4892485

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Reference TypeJournal (article/letter/editorial)
TitleGraphene defect formation by extreme ultraviolet generated photoelectrons
JournalJournal of Applied Physics
AuthorsGao, A.Author
Lee, C. J.Author
Bijkerk, F.Author
Year2014 (August 7)Volume116
Issue5
PublisherAIP Publishing
DOIdoi:10.1063/1.4892485Search in ResearchGate
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Mindat Ref. ID5200122Long-form Identifiermindat:1:5:5200122:4
GUID0
Full ReferenceGao, A., Lee, C. J., Bijkerk, F. (2014) Graphene defect formation by extreme ultraviolet generated photoelectrons. Journal of Applied Physics, 116 (5). 54312pp. doi:10.1063/1.4892485
Plain TextGao, A., Lee, C. J., Bijkerk, F. (2014) Graphene defect formation by extreme ultraviolet generated photoelectrons. Journal of Applied Physics, 116 (5). 54312pp. doi:10.1063/1.4892485
In(2014, August) Journal of Applied Physics Vol. 116 (5) AIP Publishing

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Gao, A., Zoethout, E., Sturm, J.M., Lee, C.J., Bijkerk, F. (2014) Defect formation in single layer graphene under extreme ultraviolet irradiation. Applied Surface Science, 317. 745-751 doi:10.1016/j.apsusc.2014.08.177
Gao, A., Rizo, P. J., Zoethout, E., Scaccabarozzi, L., Lee, C. J., Banine, V., Bijkerk, F. (2013) Extreme ultraviolet induced defects on few-layer graphene. Journal of Applied Physics, 114 (4). 44313pp. doi:10.1063/1.4817082
Gao, A., Rizo, P. J., Scaccabarozzi, L., Lee, C. J., Banine, V., Bijkerk, F. (2015) Photoluminescence-based detection of particle contamination on extreme ultraviolet reticles. Review of Scientific Instruments, 86 (6). 63109pp. doi:10.1063/1.4922883
Dolgov, A, Lopaev, D, Rachimova, T, Kovalev, A, Vasil'eva, A, Lee, C J, Krivtsun, V M, Yakushev, O, Bijkerk, F (2014) Comparison of H2and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas. Journal of Physics D: Applied Physics, 47. 65205pp. doi:10.1088/0022-3727/47/6/065205
van den Boogaard, A. J. R., Zoethout, E., Makhotkin, I. A., Louis, E., Bijkerk, F. (2012) Influence of noble gas ion polishing species on extreme ultraviolet mirrors. Journal of Applied Physics, 112 (12). 123502pp. doi:10.1063/1.4768915
Mund, B.K., Sturm, J.M., Lee, C.J., Bijkerk, F. (2018) Formation of H2O on a CO2 dosed Ru(0β€―0β€―0β€―1) surface under Extreme Ultraviolet Light and H2. Applied Surface Science, 456. 538-544 doi:10.1016/j.apsusc.2018.06.166
Nyabero, S. L., van de Kruijs, R. W. E., Yakshin, A. E., Bijkerk, F. (2013) Enhanced thermal stability of extreme ultraviolet multilayers by balancing diffusion-induced structural changes. Applied Physics Letters, 103 (9). 93105pp. doi:10.1063/1.4819851
Wieggers, R. C., Goedheer, W. J., Akdim, M. R., Bijkerk, F., Zegeling, P. A. (2008) A particle-in-cell plus Monte Carlo study of plasma-induced damage of normal incidence collector optics used in extreme ultraviolet lithography. Journal of Applied Physics, 103 (1). 13308pp. doi:10.1063/1.2829783
Mund, B.K., Sturm, J.M., Lee, C.J., Bijkerk, F. (2018) Aromatic structure degradation of single layer graphene on an amorphous silicon substrate in the presence of water, hydrogen and Extreme Ultraviolet light. Applied Surface Science, 427. 1033-1040 doi:10.1016/j.apsusc.2017.09.098
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