Reference Type | Journal (article/letter/editorial) |
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Title | Thermodynamic modelling of fast dopant diffusion in Si |
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Journal | Journal of Applied Physics |
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Authors | Saltas, V. | Author |
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Chroneos, A. | Author |
Vallianatos, F. | Author |
Year | 2018 (April 28) | Volume | 123 |
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Issue | 16 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.5001755Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 5208807 | Long-form Identifier | mindat:1:5:5208807:4 |
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GUID | 0 |
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Full Reference | Saltas, V., Chroneos, A., Vallianatos, F. (2018) Thermodynamic modelling of fast dopant diffusion in Si. Journal of Applied Physics, 123 (16). 161527pp. doi:10.1063/1.5001755 |
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Plain Text | Saltas, V., Chroneos, A., Vallianatos, F. (2018) Thermodynamic modelling of fast dopant diffusion in Si. Journal of Applied Physics, 123 (16). 161527pp. doi:10.1063/1.5001755 |
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In | (2018, April) Journal of Applied Physics Vol. 123 (16) AIP Publishing |
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