Reference Type | Journal (article/letter/editorial) |
---|
Title | A study of wafer and device charging during high current ion implantation |
---|
Journal | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms |
---|
Authors | Basra, Vijay K. | Author |
---|
McKenna, Charles M. | Author |
Felch, Susan B. | Author |
Year | 1987 (January) | Volume | 21 |
---|
Issue | 1 |
---|
Publisher | Elsevier BV |
---|
DOI | doi:10.1016/0168-583x(87)90857-3Search in ResearchGate |
---|
| Generate Citation Formats |
Mindat Ref. ID | 5588140 | Long-form Identifier | mindat:1:5:5588140:9 |
---|
|
GUID | 0 |
---|
Full Reference | Basra, Vijay K., McKenna, Charles M., Felch, Susan B. (1987) A study of wafer and device charging during high current ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 21 (1). 360-365 doi:10.1016/0168-583x(87)90857-3 |
---|
Plain Text | Basra, Vijay K., McKenna, Charles M., Felch, Susan B. (1987) A study of wafer and device charging during high current ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 21 (1). 360-365 doi:10.1016/0168-583x(87)90857-3 |
---|
In | (1987, January) Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Vol. 21 (1) Elsevier BV |
---|
These are possibly similar items as determined by title/reference text matching only.