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Simonton, Robert B., Kamenitsa, Dennis E., Ray, Andrew M., Park, Changhae, Klein, Kevin M., Tasch, Al F. (1991) Channeling control for large tilt angle implantation in Si γ€ˆ100〉. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 39-44 doi:10.1016/0168-583x(91)96132-5

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Reference TypeJournal (article/letter/editorial)
TitleChanneling control for large tilt angle implantation in Si γ€ˆ100〉
JournalNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
AuthorsSimonton, Robert B.Author
Kamenitsa, Dennis E.Author
Ray, Andrew M.Author
Park, ChanghaeAuthor
Klein, Kevin M.Author
Tasch, Al F.Author
Year1991 (April)Volume55
Issue1
PublisherElsevier BV
DOIdoi:10.1016/0168-583x(91)96132-5Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5596229Long-form Identifiermindat:1:5:5596229:0
GUID0
Full ReferenceSimonton, Robert B., Kamenitsa, Dennis E., Ray, Andrew M., Park, Changhae, Klein, Kevin M., Tasch, Al F. (1991) Channeling control for large tilt angle implantation in Si γ€ˆ100〉. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 39-44 doi:10.1016/0168-583x(91)96132-5
Plain TextSimonton, Robert B., Kamenitsa, Dennis E., Ray, Andrew M., Park, Changhae, Klein, Kevin M., Tasch, Al F. (1991) Channeling control for large tilt angle implantation in Si γ€ˆ100〉. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 39-44 doi:10.1016/0168-583x(91)96132-5
In(1991, April) Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Vol. 55 (1) Elsevier BV

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Simonton, Robert B., Kamenitsa, Dennis E., Ray, Andy M. (1991) Process control issues for ion implantation using large tilt angles. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 188-192 doi:10.1016/0168-583x(91)96159-i
Park, Changhae, Klein, Kevin M., Tasch, Al F., Simonton, Robert B., Kamenitsa, Dennis E., Novak, Steve (1991) Boron implant profile variation across a single wafer due to electrostatic scanning. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 59. 159-163 doi:10.1016/0168-583x(91)95198-m
Klein, Kevin M., Park, Changhae, Tasch, Al F. (1991) Modeling of cumulative damage effects on ion-implantation profiles. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 59. 60-64 doi:10.1016/0168-583x(91)95175-d
Simonton, Robert, Kamenitsa, Dennis (1989) Channeling control in silicon γ€ˆ111〉 substrates by target orientation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 37. 344-347 doi:10.1016/0168-583x(89)90200-0
Simonton, Robert B., Magee, Charles W., Tasch, Al F. (1993) High Miller index channeling in silicon substrates. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 74 (1). 142-146 doi:10.1016/0168-583x(93)95032-z
Kamenitsa, Dennis E., Simonton, Robert B. (1993) Sources of variation in therma wave measurements of ion implanted wafers. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 74 (1). 234-237 doi:10.1016/0168-583x(93)95050-f
Dykstra, Jerald P., Ray, Andy M., Simonton, Robert B. (1991) A versatile ion implanter for planar and 3D device construction. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 478-481 doi:10.1016/0168-583x(91)96216-8
Simonton, Robert, King, Monty, Kamenitsa, Dennis E. (1989) Higher charge state ion beam purity in the Eaton medium current implanter. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 37. 616-619 doi:10.1016/0168-583x(89)90260-7
Bausells, J., Badenes, G., Lora-Tamayo, E. (1991) Calculation of channeling effects in ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 666-670 doi:10.1016/0168-583x(91)96254-i
Sasaki, M., Tanaka, M., Kawakami, H., Kumazaki, H. (1989) Beam scanning system for large tilt angle ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 37. 469-471 doi:10.1016/0168-583x(89)90226-7
Tasch, Al F. (1993) Ion implantation in future MOS technology. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 74 (1). 3-6 doi:10.1016/0168-583x(93)95005-p
 
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