Bundesmann, C., Lautenschläger, T., Thelander, E., Spemann, D. (2017) Reactive Ar ion beam sputter deposition of TiO2 films: Influence of process parameters on film properties. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 395. 17-23 doi:10.1016/j.nimb.2017.01.078
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Reactive Ar ion beam sputter deposition of TiO2 films: Influence of process parameters on film properties | ||
| Journal | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | ||
| Authors | Bundesmann, C. | Author | |
| Lautenschläger, T. | Author | ||
| Thelander, E. | Author | ||
| Spemann, D. | Author | ||
| Year | 2017 (March) | Volume | 395 |
| Publisher | Elsevier BV | ||
| DOI | doi:10.1016/j.nimb.2017.01.078Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 5654013 | Long-form Identifier | mindat:1:5:5654013:8 |
| GUID | 0 | ||
| Full Reference | Bundesmann, C., Lautenschläger, T., Thelander, E., Spemann, D. (2017) Reactive Ar ion beam sputter deposition of TiO2 films: Influence of process parameters on film properties. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 395. 17-23 doi:10.1016/j.nimb.2017.01.078 | ||
| Plain Text | Bundesmann, C., Lautenschläger, T., Thelander, E., Spemann, D. (2017) Reactive Ar ion beam sputter deposition of TiO2 films: Influence of process parameters on film properties. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 395. 17-23 doi:10.1016/j.nimb.2017.01.078 | ||
| In | (2017) Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Vol. 395. Elsevier BV | ||
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