Reference Type | Journal (article/letter/editorial) |
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Title | Scattering effects in ion beam exposure of photoresist polymer films |
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Journal | Journal of Physics D: Applied Physics |
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Authors | Kanaya, K | Author |
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Shimizu, K | Author |
Ishikawa, Y | Author |
Year | 1968 (December 1) | Volume | 1 |
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Publisher | IOP Publishing |
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DOI | doi:10.1088/0022-3727/1/12/311Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 5656175 | Long-form Identifier | mindat:1:5:5656175:1 |
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GUID | 0 |
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Full Reference | Kanaya, K, Shimizu, K, Ishikawa, Y (1968) Scattering effects in ion beam exposure of photoresist polymer films. Journal of Physics D: Applied Physics, 1. 1657-1665 doi:10.1088/0022-3727/1/12/311 |
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Plain Text | Kanaya, K, Shimizu, K, Ishikawa, Y (1968) Scattering effects in ion beam exposure of photoresist polymer films. Journal of Physics D: Applied Physics, 1. 1657-1665 doi:10.1088/0022-3727/1/12/311 |
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In | (1968) Journal of Physics D: Applied Physics Vol. 1. IOP Publishing |
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