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Nishimura, Tomoaki., Kasai, Takeshi, Mishima, Tomonori, Kuriyama, Kazuo, Nakamura, Tohru (2019) Reduction in contact resistance and structural evaluation of Al/Ti electrodes on Si-implanted GaN. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 450. 244-247 doi:10.1016/j.nimb.2018.09.001

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Reference TypeJournal (article/letter/editorial)
TitleReduction in contact resistance and structural evaluation of Al/Ti electrodes on Si-implanted GaN
JournalNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
AuthorsNishimura, Tomoaki.Author
Kasai, TakeshiAuthor
Mishima, TomonoriAuthor
Kuriyama, KazuoAuthor
Nakamura, TohruAuthor
Year2019 (July)Volume450
PublisherElsevier BV
DOIdoi:10.1016/j.nimb.2018.09.001Search in ResearchGate
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Mindat Ref. ID5657145Long-form Identifiermindat:1:5:5657145:7
GUID0
Full ReferenceNishimura, Tomoaki., Kasai, Takeshi, Mishima, Tomonori, Kuriyama, Kazuo, Nakamura, Tohru (2019) Reduction in contact resistance and structural evaluation of Al/Ti electrodes on Si-implanted GaN. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 450. 244-247 doi:10.1016/j.nimb.2018.09.001
Plain TextNishimura, Tomoaki., Kasai, Takeshi, Mishima, Tomonori, Kuriyama, Kazuo, Nakamura, Tohru (2019) Reduction in contact resistance and structural evaluation of Al/Ti electrodes on Si-implanted GaN. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 450. 244-247 doi:10.1016/j.nimb.2018.09.001
In(2019) Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Vol. 450. Elsevier BV

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