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Radouane, K, Date, L, Yousfi, M, Despax, B, Caquineau, H (2000) RF discharge modelling in a N2O/SiH4mixture for SiO2deposition and comparison with experiment. Journal of Physics D: Applied Physics, 33. 1332-1341 doi:10.1088/0022-3727/33/11/312

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Reference TypeJournal (article/letter/editorial)
TitleRF discharge modelling in a N2O/SiH4mixture for SiO2deposition and comparison with experiment
JournalJournal of Physics D: Applied Physics
AuthorsRadouane, KAuthor
Date, LAuthor
Yousfi, MAuthor
Despax, BAuthor
Caquineau, HAuthor
Year2000 (June 7)Volume33
PublisherIOP Publishing
DOIdoi:10.1088/0022-3727/33/11/312Search in ResearchGate
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Mindat Ref. ID5667953Long-form Identifiermindat:1:5:5667953:7
GUID0
Full ReferenceRadouane, K, Date, L, Yousfi, M, Despax, B, Caquineau, H (2000) RF discharge modelling in a N2O/SiH4mixture for SiO2deposition and comparison with experiment. Journal of Physics D: Applied Physics, 33. 1332-1341 doi:10.1088/0022-3727/33/11/312
Plain TextRadouane, K, Date, L, Yousfi, M, Despax, B, Caquineau, H (2000) RF discharge modelling in a N2O/SiH4mixture for SiO2deposition and comparison with experiment. Journal of Physics D: Applied Physics, 33. 1332-1341 doi:10.1088/0022-3727/33/11/312
In(2000) Journal of Physics D: Applied Physics Vol. 33. IOP Publishing

See Also

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Date, L, Radouane, K, Despax, B, Yousfi, M, Caquineau, H, Hennad, A (1999) Analysis of the N2O dissociation in a RF discharge reactor. Journal of Physics D: Applied Physics, 32. 1478-1488 doi:10.1088/0022-3727/32/13/307
Despax, B, Yousfi, M, Younis, G, Caquineau, H (2005) Power dissipation analysis in N2O/He RF discharges using particle modelling. Journal of Physics D: Applied Physics, 38. 4290-4295 doi:10.1088/0022-3727/38/24/004
Younis, G, Despax, B, Yousfi, M, Caquineau, H (2007) Power dissipation analysis in N2O RF discharges using Monte Carlo modelling. Journal of Physics D: Applied Physics, 40. 2045-2054 doi:10.1088/0022-3727/40/7/029
Zorat, R, Vender, D (2000) Global model for an rf hydrogen inductive plasma discharge in the deuterium negative ion source experiment including negative ions. Journal of Physics D: Applied Physics, 33. 1728-1735 doi:10.1088/0022-3727/33/14/312
Cartry, G, Magne, L, Cernogora, G (2000) Atomic oxygen recombination on fused silica: modelling and comparison to low-temperature experiments (300 K)*. Journal of Physics D: Applied Physics, 33. 1303-1314 doi:10.1088/0022-3727/33/11/309
Gupta, Nandini, Raju, G R Govinda (2000) Dissipated power in a radio-frequency discharge in oxygen. Journal of Physics D: Applied Physics, 33. 2949-2953 doi:10.1088/0022-3727/33/22/312
Takaki, K, Kitamura, D, Fujiwara, T (2000) Characteristics of a high-current transient glow discharge in dry air. Journal of Physics D: Applied Physics, 33. 1369-1375 doi:10.1088/0022-3727/33/11/316
Jani, Muaffaq A, Toda, K, Takaki, K, Fujiwara, T (2000) An experimental comparison between electrode shapes for NOxtreatment using a dielectric barrier discharge. Journal of Physics D: Applied Physics, 33. 3078-3082 doi:10.1088/0022-3727/33/23/311
Aubreton, J, Conte, D, Jauberteau, J L, Jauberteau, I (2000) Measurement of rate constants between atomic nitrogen and silane in a nitrogen discharge afterglow. Journal of Physics D: Applied Physics, 33. 1499-1506 doi:10.1088/0022-3727/33/12/312
Schlager, W, Neiger, M (2000) A novel experimental method forin situdiagnostics of electrode workfunctions in high-pressure gas discharge lamps during operation. Journal of Physics D: Applied Physics, 33. 3083-3093 doi:10.1088/0022-3727/33/23/312
Murphy, A B, Hiraoka, K (2000) A comparison of measurements and calculations of demixing in free-burning arcs. Journal of Physics D: Applied Physics, 33. 2183-2188 doi:10.1088/0022-3727/33/17/313
 
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