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Sha-Li, Shi, Da-Peng, Chen, Yi, Ou, Yu-Peng, Jing, Qiu-Xia, Xu, Tian-Chun, Ye (2010) A novel anti-shock silicon etching apparatus for solving diaphragm release problems. Chinese Physics B, 19. 60701pp. doi:10.1088/1674-1056/19/6/060701

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Reference TypeJournal (article/letter/editorial)
TitleA novel anti-shock silicon etching apparatus for solving diaphragm release problems
JournalChinese Physics B
AuthorsSha-Li, ShiAuthor
Da-Peng, ChenAuthor
Yi, OuAuthor
Yu-Peng, JingAuthor
Qiu-Xia, XuAuthor
Tian-Chun, YeAuthor
Year2010 (June)Volume19
PublisherIOP Publishing
DOIdoi:10.1088/1674-1056/19/6/060701Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID6000369Long-form Identifiermindat:1:5:6000369:8
GUID0
Full ReferenceSha-Li, Shi, Da-Peng, Chen, Yi, Ou, Yu-Peng, Jing, Qiu-Xia, Xu, Tian-Chun, Ye (2010) A novel anti-shock silicon etching apparatus for solving diaphragm release problems. Chinese Physics B, 19. 60701pp. doi:10.1088/1674-1056/19/6/060701
Plain TextSha-Li, Shi, Da-Peng, Chen, Yi, Ou, Yu-Peng, Jing, Qiu-Xia, Xu, Tian-Chun, Ye (2010) A novel anti-shock silicon etching apparatus for solving diaphragm release problems. Chinese Physics B, 19. 60701pp. doi:10.1088/1674-1056/19/6/060701
In(n.d.) Chinese Physics B Vol. 19. IOP Publishing

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