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Zhu, Nai-Wei, Hu, Ming, Xia, Xiao-Xu, Wei, Xiao-Ying, Liang, Ji-Ran (2014) Preparation and modification of VO 2 thin film on R-sapphire substrate by rapid thermal process. Chinese Physics B, 23. 48108pp. doi:10.1088/1674-1056/23/4/048108

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Reference TypeJournal (article/letter/editorial)
TitlePreparation and modification of VO 2 thin film on R-sapphire substrate by rapid thermal process
JournalChinese Physics B
AuthorsZhu, Nai-WeiAuthor
Hu, MingAuthor
Xia, Xiao-XuAuthor
Wei, Xiao-YingAuthor
Liang, Ji-RanAuthor
Year2014 (April)Volume23
PublisherIOP Publishing
DOIdoi:10.1088/1674-1056/23/4/048108Search in ResearchGate
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Mindat Ref. ID6004900Long-form Identifiermindat:1:5:6004900:7
GUID0
Full ReferenceZhu, Nai-Wei, Hu, Ming, Xia, Xiao-Xu, Wei, Xiao-Ying, Liang, Ji-Ran (2014) Preparation and modification of VO 2 thin film on R-sapphire substrate by rapid thermal process. Chinese Physics B, 23. 48108pp. doi:10.1088/1674-1056/23/4/048108
Plain TextZhu, Nai-Wei, Hu, Ming, Xia, Xiao-Xu, Wei, Xiao-Ying, Liang, Ji-Ran (2014) Preparation and modification of VO 2 thin film on R-sapphire substrate by rapid thermal process. Chinese Physics B, 23. 48108pp. doi:10.1088/1674-1056/23/4/048108
In(n.d.) Chinese Physics B Vol. 23. IOP Publishing

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