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Liang, Ji-Ran, Wu, Mai-Jun, Hu, Ming, Liu, Jian, Zhu, Nai-Wei, Xia, Xiao-Xu, Chen, Hong-Da (2014) Fabrication of VO 2 thin film by rapid thermal annealing in oxygen atmosphere and its metal—insulator phase transition properties. Chinese Physics B, 23. 76801pp. doi:10.1088/1674-1056/23/7/076801

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Reference TypeJournal (article/letter/editorial)
TitleFabrication of VO 2 thin film by rapid thermal annealing in oxygen atmosphere and its metal—insulator phase transition properties
JournalChinese Physics B
AuthorsLiang, Ji-RanAuthor
Wu, Mai-JunAuthor
Hu, MingAuthor
Liu, JianAuthor
Zhu, Nai-WeiAuthor
Xia, Xiao-XuAuthor
Chen, Hong-DaAuthor
Year2014 (July)Volume23
PublisherIOP Publishing
DOIdoi:10.1088/1674-1056/23/7/076801Search in ResearchGate
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Mindat Ref. ID6005204Long-form Identifiermindat:1:5:6005204:7
GUID0
Full ReferenceLiang, Ji-Ran, Wu, Mai-Jun, Hu, Ming, Liu, Jian, Zhu, Nai-Wei, Xia, Xiao-Xu, Chen, Hong-Da (2014) Fabrication of VO 2 thin film by rapid thermal annealing in oxygen atmosphere and its metal—insulator phase transition properties. Chinese Physics B, 23. 76801pp. doi:10.1088/1674-1056/23/7/076801
Plain TextLiang, Ji-Ran, Wu, Mai-Jun, Hu, Ming, Liu, Jian, Zhu, Nai-Wei, Xia, Xiao-Xu, Chen, Hong-Da (2014) Fabrication of VO 2 thin film by rapid thermal annealing in oxygen atmosphere and its metal—insulator phase transition properties. Chinese Physics B, 23. 76801pp. doi:10.1088/1674-1056/23/7/076801
In(n.d.) Chinese Physics B Vol. 23. IOP Publishing

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