Fejfar, A., Poruba, A., Vaněček, M., Kočka, J. (1996) Precise measurement of the deep defects and surface states in a-Si:H films by absolute CPM. Journal of Non-Crystalline Solids, 198. 304-308 doi:10.1016/0022-3093(95)00692-3
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Precise measurement of the deep defects and surface states in a-Si:H films by absolute CPM | ||
Journal | Journal of Non-Crystalline Solids | ||
Authors | Fejfar, A. | Author | |
Poruba, A. | Author | ||
Vaněček, M. | Author | ||
Kočka, J. | Author | ||
Year | 1996 (May) | Volume | 198 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/0022-3093(95)00692-3Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 635385 | Long-form Identifier | mindat:1:5:635385:2 |
GUID | 0 | ||
Full Reference | Fejfar, A., Poruba, A., Vaněček, M., Kočka, J. (1996) Precise measurement of the deep defects and surface states in a-Si:H films by absolute CPM. Journal of Non-Crystalline Solids, 198. 304-308 doi:10.1016/0022-3093(95)00692-3 | ||
Plain Text | Fejfar, A., Poruba, A., Vaněček, M., Kočka, J. (1996) Precise measurement of the deep defects and surface states in a-Si:H films by absolute CPM. Journal of Non-Crystalline Solids, 198. 304-308 doi:10.1016/0022-3093(95)00692-3 | ||
In | (1996) Journal of Non-Crystalline Solids Vol. 198. Elsevier BV |
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