Reference Type | Journal (article/letter/editorial) |
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Title | Effect of mechanical anisotropy on material removal rate and surface quality during polishing CdZnTe wafers |
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Journal | Rare Metals |
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Authors | Li, Yan | Author |
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Jie, Wanqi | Author |
Kang, Renke | Author |
Gao, Hang | Author |
Year | 2011 (August) | Volume | 30 |
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Publisher | Springer Science and Business Media LLC |
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DOI | doi:10.1007/s12598-011-0400-8Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 8049143 | Long-form Identifier | mindat:1:5:8049143:9 |
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GUID | 0 |
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Full Reference | Li, Yan, Jie, Wanqi, Kang, Renke, Gao, Hang (2011) Effect of mechanical anisotropy on material removal rate and surface quality during polishing CdZnTe wafers. Rare Metals, 30. 381-386 doi:10.1007/s12598-011-0400-8 |
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Plain Text | Li, Yan, Jie, Wanqi, Kang, Renke, Gao, Hang (2011) Effect of mechanical anisotropy on material removal rate and surface quality during polishing CdZnTe wafers. Rare Metals, 30. 381-386 doi:10.1007/s12598-011-0400-8 |
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In | (2011) Rare Metals Vol. 30. Springer Science and Business Media LLC |
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