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Pan, Li, Bai, Yizhen, Zhang, Dong, Wang, Jian (2012) Ti-Si-N films prepared by magnetron sputtering. Rare Metals, 31. 183-188 doi:10.1007/s12598-012-0488-5

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Reference TypeJournal (article/letter/editorial)
TitleTi-Si-N films prepared by magnetron sputtering
JournalRare Metals
AuthorsPan, LiAuthor
Bai, YizhenAuthor
Zhang, DongAuthor
Wang, JianAuthor
Year2012 (April)Volume31
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/s12598-012-0488-5Search in ResearchGate
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Mindat Ref. ID8049312Long-form Identifiermindat:1:5:8049312:7
GUID0
Full ReferencePan, Li, Bai, Yizhen, Zhang, Dong, Wang, Jian (2012) Ti-Si-N films prepared by magnetron sputtering. Rare Metals, 31. 183-188 doi:10.1007/s12598-012-0488-5
Plain TextPan, Li, Bai, Yizhen, Zhang, Dong, Wang, Jian (2012) Ti-Si-N films prepared by magnetron sputtering. Rare Metals, 31. 183-188 doi:10.1007/s12598-012-0488-5
In(2012) Rare Metals Vol. 31. Springer Science and Business Media LLC

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