Kuech, T. F., Potemski, R. (1985) Reduction of background doping in metalorganic vapor phase epitaxy of GaAs using triethylgallium at low reactor pressures. Applied Physics Letters, 47 (8). 821-823 doi:10.1063/1.95995
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Reduction of background doping in metalorganic vapor phase epitaxy of GaAs using triethylgallium at low reactor pressures | ||
Journal | Applied Physics Letters | ||
Authors | Kuech, T. F. | Author | |
Potemski, R. | Author | ||
Year | 1985 (October 15) | Volume | 47 |
Issue | 8 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.95995Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8476789 | Long-form Identifier | mindat:1:5:8476789:9 |
GUID | 0 | ||
Full Reference | Kuech, T. F., Potemski, R. (1985) Reduction of background doping in metalorganic vapor phase epitaxy of GaAs using triethylgallium at low reactor pressures. Applied Physics Letters, 47 (8). 821-823 doi:10.1063/1.95995 | ||
Plain Text | Kuech, T. F., Potemski, R. (1985) Reduction of background doping in metalorganic vapor phase epitaxy of GaAs using triethylgallium at low reactor pressures. Applied Physics Letters, 47 (8). 821-823 doi:10.1063/1.95995 | ||
In | (1985, October) Applied Physics Letters Vol. 47 (8) AIP Publishing |
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