Vote for your favorite mineral in #MinCup25! - Carpathite vs. Tugtupite
Battle of mineralogical oddities as organic mineral #carpathite battles against vs #tugtupite, a mineral that looks like reindeer blood!
Log InRegister
Quick Links : The Mindat ManualThe Rock H. Currier Digital LibraryMindat Newsletter [Free Download]
Home PageAbout MindatThe Mindat ManualHistory of MindatCopyright StatusWho We AreContact UsAdvertise on Mindat
Donate to MindatCorporate SponsorshipSponsor a PageSponsored PagesMindat AdvertisersAdvertise on Mindat
Learning CenterWhat is a mineral?The most common minerals on earthInformation for EducatorsMindat ArticlesThe ElementsThe Rock H. Currier Digital LibraryGeologic Time
Minerals by PropertiesMinerals by ChemistryAdvanced Locality SearchRandom MineralRandom LocalitySearch by minIDLocalities Near MeSearch ArticlesSearch GlossaryMore Search Options
Search For:
Mineral Name:
Locality Name:
Keyword(s):
 
The Mindat ManualAdd a New PhotoRate PhotosLocality Edit ReportCoordinate Completion ReportAdd Glossary Item
Mining CompaniesStatisticsUsersMineral MuseumsClubs & OrganizationsMineral Shows & EventsThe Mindat DirectoryDevice SettingsThe Mineral Quiz
Photo SearchPhoto GalleriesSearch by ColorNew Photos TodayNew Photos YesterdayMembers' Photo GalleriesPast Photo of the Day GalleryPhotography

Oehrlein, Gottlieb S., Scilla, Gerald J., Jeng, Shwu‐Jen (1988) Efficiency of oxygen plasma cleaning of reactive ion damaged silicon surfaces. Applied Physics Letters, 52 (11). 907-909 doi:10.1063/1.99269

Advanced
   -   Only viewable:
Reference TypeJournal (article/letter/editorial)
TitleEfficiency of oxygen plasma cleaning of reactive ion damaged silicon surfaces
JournalApplied Physics Letters
AuthorsOehrlein, Gottlieb S.Author
Scilla, Gerald J.Author
Jeng, Shwu‐JenAuthor
Year1988 (March 14)Volume52
Issue11
PublisherAIP Publishing
DOIdoi:10.1063/1.99269Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8482517Long-form Identifiermindat:1:5:8482517:5
GUID0
Full ReferenceOehrlein, Gottlieb S., Scilla, Gerald J., Jeng, Shwu‐Jen (1988) Efficiency of oxygen plasma cleaning of reactive ion damaged silicon surfaces. Applied Physics Letters, 52 (11). 907-909 doi:10.1063/1.99269
Plain TextOehrlein, Gottlieb S., Scilla, Gerald J., Jeng, Shwu‐Jen (1988) Efficiency of oxygen plasma cleaning of reactive ion damaged silicon surfaces. Applied Physics Letters, 52 (11). 907-909 doi:10.1063/1.99269
In(1988, March) Applied Physics Letters Vol. 52 (11) AIP Publishing

See Also

These are possibly similar items as determined by title/reference text matching only.

Jeng, S. J., Oehrlein, G. S., Scilla, G. J. (1988) Hydrogen plasma induced defects in silicon. Applied Physics Letters, 53 (18). 1735-1737 doi:10.1063/1.99810
Jeng, S. J., Oehrlein, G. S. (1987) Microstructural studies of reactive ion etched silicon. Applied Physics Letters, 50 (26). 1912-1914 doi:10.1063/1.97684
Bestwick, Tim D., Oehrlein, Gottlieb S., Angell, David (1990) Cryogenic reactive ion etching of silicon in SF6. Applied Physics Letters, 57 (5). 431-433 doi:10.1063/1.104240
Oehrlein, Gottlieb S., Robey, Steve W., Lindström, J. Lennart (1988) Surface processes in CF4/O2reactive etching of silicon. Applied Physics Letters, 52 (14). 1170-1172 doi:10.1063/1.99195
Oehrlein, Gottlieb S. (1986) Reactive‐Ion Etching. Physics Today, 39. 26-33 doi:10.1063/1.881066
Henry, A., Awadelkarim, O. O., Lindström, J. L., Oehrlein, G. S. (1989) Electrical studies on plasma and reactive‐ion‐etched silicon. Journal of Applied Physics, 66 (11). 5388-5393 doi:10.1063/1.343683
Oehrlein, Gottlieb S. (1986) Rutherford backscattering studies of plasma‐etched silicon. Journal of Applied Physics, 59 (9). 3053-3062 doi:10.1063/1.336928
Jackel, J. L., Howard, R. E., Hu, E. L., Lyman, S. P. (1981) Reactive ion etching of LiNbO3. Applied Physics Letters, 38 (11). 907-909 doi:10.1063/1.92177
Kroesen, G. M. W., Oehrlein, G. S., de Frésart, E., Scilla, G. J. (1992) Refractive index determination of SiGe using reactive ion etching/ellipsometry: Application of the depth profiling of the GE concentration. Applied Physics Letters, 60 (11). 1351-1353 doi:10.1063/1.107314
Copel, M., Tromp, R. M., Robey, S. W., Oehrlein, G. S. (1988) Medium energy ion scattering analysis of reactive ion etched Si(001) surfaces. Applied Physics Letters, 53 (23). 2317-2319 doi:10.1063/1.100265
Pelletier, J. (1988) Comment on ‘‘Low‐temperature reactive ion etching and microwave plasma etching of silicon’’ [Appl. Phys. Lett. 52, 616 (1988)]. Applied Physics Letters, 53 (17). 1665-1666 doi:10.1063/1.99792
 
and/or  
Mindat.org is an outreach project of the Hudson Institute of Mineralogy, a 501(c)(3) not-for-profit organization.
Copyright © mindat.org and the Hudson Institute of Mineralogy 1993-2025, except where stated. Most political location boundaries are © OpenStreetMap contributors. Mindat.org relies on the contributions of thousands of members and supporters. Founded in 2000 by Jolyon Ralph.
To cite: Ralph, J., Von Bargen, D., Martynov, P., Zhang, J., Que, X., Prabhu, A., Morrison, S. M., Li, W., Chen, W., & Ma, X. (2025). Mindat.org: The open access mineralogy database to accelerate data-intensive geoscience research. American Mineralogist, 110(6), 833–844. doi:10.2138/am-2024-9486.
Privacy Policy - Terms & Conditions - Contact Us / DMCA issues - Report a bug/vulnerability Current server date and time: September 20, 2025 11:58:19
Go to top of page