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Matsuoka, Morito, Ono, Ken’ichi (1988) Dense plasma production for high rate sputtering by means of an electric mirror. Applied Physics Letters, 53 (21). 2025-2027 doi:10.1063/1.100310

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Reference TypeJournal (article/letter/editorial)
TitleDense plasma production for high rate sputtering by means of an electric mirror
JournalApplied Physics Letters
AuthorsMatsuoka, MoritoAuthor
Ono, Ken’ichiAuthor
Year1988 (November 21)Volume53
Issue21
PublisherAIP Publishing
DOIdoi:10.1063/1.100310Search in ResearchGate
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Mindat Ref. ID8484875Long-form Identifiermindat:1:5:8484875:0
GUID0
Full ReferenceMatsuoka, Morito, Ono, Ken’ichi (1988) Dense plasma production for high rate sputtering by means of an electric mirror. Applied Physics Letters, 53 (21). 2025-2027 doi:10.1063/1.100310
Plain TextMatsuoka, Morito, Ono, Ken’ichi (1988) Dense plasma production for high rate sputtering by means of an electric mirror. Applied Physics Letters, 53 (21). 2025-2027 doi:10.1063/1.100310
In(1988, November) Applied Physics Letters Vol. 53 (21) AIP Publishing

See Also

These are possibly similar items as determined by title/reference text matching only.

Matsuoka, Morito, Ono, Ken’ichi (1989) New high‐rate sputtering‐type electron cyclotron resonance microwave plasma using an electric mirror. Applied Physics Letters, 54 (17). 1645-1647 doi:10.1063/1.101310
Matsuoka, Morito, Ono, Ken’ichi (1989) A new sputtering‐type electron cyclotron resonance microwave plasma using an electric mirror and high‐rate deposition. Journal of Applied Physics, 65 (11). 4403-4409 doi:10.1063/1.343279
Matsuoka, Morito, Ono, Ken’ichi (1988) Photochromism and anomalous crystallite orientation of ZnO films prepared by a sputtering‐type electron cyclotron resonance microwave plasma. Applied Physics Letters, 53 (15). 1393-1395 doi:10.1063/1.99987
Matsuoka, Morito, Ono, Ken’ichi (1987) Low‐energy ion extraction with small dispersion from an electron cyclotron resonance microwave plasma stream. Applied Physics Letters, 50 (26). 1864-1866 doi:10.1063/1.97719
Matsuoka, Morito, Ono, Ken'ichi (1988) Ion energy analysis for sputtering‐type electron‐cyclotron‐resonance microwave plasma. Journal of Applied Physics, 64 (10). 5179-5182 doi:10.1063/1.342534
Matsuoka, Morito, Ono, Ken’ichi (1986) Crystal structure of sputter‐synthesized CoNxthin films. Applied Physics Letters, 49 (24). 1644-1646 doi:10.1063/1.97253
Matsuoka, Morito, Hoshino, Koichi, Ono, Ken’ichi (1994) Low‐temperature epitaxial growth of BaTiO3films by radio‐frequency‐mode electron cyclotron resonance sputtering. Journal of Applied Physics, 76 (3). 1768-1775 doi:10.1063/1.357694
Matsuoka, Morito, Ono, Ken’ichi, Inukai, Takashi (1986) Magnetic properties of cobalt nitride thin films. Applied Physics Letters, 49 (15). 977-979 doi:10.1063/1.97501
Matsuoka, Morito, Hoshi, Yoichi, Naoe, Masahiko (1988) Reactive synthesis of well‐oriented zinc‐oxide films by means of the facing targets sputtering method. Journal of Applied Physics, 63 (6). 2098-2103 doi:10.1063/1.341116
Matsuoka, Morito, Ono, Ken'ichi (1989) A Few Techniques for Preparing Conductive Material Films for Sputtering-Type Electron Cyclotron Resonance Microwave Plasma. Japanese Journal of Applied Physics, 28. doi:10.1143/jjap.28.l503
Inukai, Takashi, Matsuoka, Morito, Ono, Kenichi (1986) Magneto‐optical properties of vacuum‐deposited PtMnSb thin films. Applied Physics Letters, 49 (1). 52-53 doi:10.1063/1.97082
 
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