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Hu, S. M. (1991) Stress‐driven void growth in narrow interconnection lines. Applied Physics Letters, 59 (21). 2685-2687 doi:10.1063/1.105884

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Reference TypeJournal (article/letter/editorial)
TitleStress‐driven void growth in narrow interconnection lines
JournalApplied Physics Letters
AuthorsHu, S. M.Author
Year1991 (November 18)Volume59
Issue21
PublisherAIP Publishing
DOIdoi:10.1063/1.105884Search in ResearchGate
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Mindat Ref. ID8496428Long-form Identifiermindat:1:5:8496428:9
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Full ReferenceHu, S. M. (1991) Stress‐driven void growth in narrow interconnection lines. Applied Physics Letters, 59 (21). 2685-2687 doi:10.1063/1.105884
Plain TextHu, S. M. (1991) Stress‐driven void growth in narrow interconnection lines. Applied Physics Letters, 59 (21). 2685-2687 doi:10.1063/1.105884
In(1991, November) Applied Physics Letters Vol. 59 (21) AIP Publishing

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Bo/rgesen, P., Lee, J. K., Paszkiet, C. A., Li, C.‐Y. (1991) Kinetics of thermal stress induced void growth in narrow aluminum lines. Applied Physics Letters, 59 (11). 1341-1343 doi:10.1063/1.105302
Bean, J. C., Poate, J. M. (1980) Evidence for void interconnection in evaporated amorphous silicon from epitaxial crystallization measurements. Applied Physics Letters, 36 (1). 59-61 doi:10.1063/1.91316
Liniger, E., Gignac, L., Hu, C.-K., Kaldor, S. (2002) In situstudy of void growth kinetics in electroplated Cu lines. Journal of Applied Physics, 92 (4). 1803-1810 doi:10.1063/1.1492871
Tio Castro, D., Hoofman, R. J. O. M., Michelon, J., Gravesteijn, D. J., Bruynseraede, C. (2007) Void growth modeling upon electromigration stressing in narrow copper lines. Journal of Applied Physics, 102 (12). 123515pp. doi:10.1063/1.2822434
Citrin, D. S., Chang, Yia‐Chung (1991) Theory of optical anisotropy in quantum‐wire arrays on vicinal substrates. Journal of Applied Physics, 69 (4). 2685-2687 doi:10.1063/1.348666
Li, C.‐Y., Bo/rgesen, P., Sullivan, T. D. (1991) Stress‐migration related electromigration damage mechanism in passivated, narrow interconnects. Applied Physics Letters, 59 (12). 1464-1466 doi:10.1063/1.105289
Bower, A. F., Freund, L. B. (1993) Analysis of stress‐induced void growth mechanisms in passivated interconnect lines. Journal of Applied Physics, 74 (6). 3855-3868 doi:10.1063/1.354480
Swaminathan, V., Reynolds, C. L., Geva, M. (1995) Zn diffusion behavior in InGaAsP/InP capped mesa buried heterostructures. Applied Physics Letters, 66 (20). 2685-2687 doi:10.1063/1.113488
Hu, S. M. (1991) Stress‐related problems in silicon technology. Journal of Applied Physics, 70 (6). doi:10.1063/1.349282
Sabert, Hendrik (1991) Tunable narrow‐band Nd3+fiber laser. Applied Physics Letters, 59 (17). 2067-2069 doi:10.1063/1.106132
Snider, Gregory L., Miller, Mark S., Rooks, Michael J., Hu, Evelyn L. (1991) Quantized conductance in ballistic constrictions at 30 K. Applied Physics Letters, 59 (21). 2727-2729 doi:10.1063/1.105897
 
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