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Park, Ji-Soo, Sohn, Dong Kyun, Kim, Yeongcheol, Bae, Jong-Uk, Lee, Byung Hak, Byun, Jeong Soo, Kim, Jae Jeong (1998) Formation of epitaxial CoSi2 spike in Co/Si3N4/Si(100) system and its crystallographic structure. Applied Physics Letters, 73 (16). 2284-2286 doi:10.1063/1.121703

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Reference TypeJournal (article/letter/editorial)
TitleFormation of epitaxial CoSi2 spike in Co/Si3N4/Si(100) system and its crystallographic structure
JournalApplied Physics Letters
AuthorsPark, Ji-SooAuthor
Sohn, Dong KyunAuthor
Kim, YeongcheolAuthor
Bae, Jong-UkAuthor
Lee, Byung HakAuthor
Byun, Jeong SooAuthor
Kim, Jae JeongAuthor
Year1998 (October 19)Volume73
Issue16
PublisherAIP Publishing
DOIdoi:10.1063/1.121703Search in ResearchGate
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Mindat Ref. ID8522073Long-form Identifiermindat:1:5:8522073:9
GUID0
Full ReferencePark, Ji-Soo, Sohn, Dong Kyun, Kim, Yeongcheol, Bae, Jong-Uk, Lee, Byung Hak, Byun, Jeong Soo, Kim, Jae Jeong (1998) Formation of epitaxial CoSi2 spike in Co/Si3N4/Si(100) system and its crystallographic structure. Applied Physics Letters, 73 (16). 2284-2286 doi:10.1063/1.121703
Plain TextPark, Ji-Soo, Sohn, Dong Kyun, Kim, Yeongcheol, Bae, Jong-Uk, Lee, Byung Hak, Byun, Jeong Soo, Kim, Jae Jeong (1998) Formation of epitaxial CoSi2 spike in Co/Si3N4/Si(100) system and its crystallographic structure. Applied Physics Letters, 73 (16). 2284-2286 doi:10.1063/1.121703
In(1998, October) Applied Physics Letters Vol. 73 (16) AIP Publishing

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Sohn, Dong Kyun, Park, Ji-Soo, Lee, Byung Hak, Bae, Jong-Uk, Byun, Jeong Soo, Kim, Jae Jeong (1998) Formation of CoTi barrier and increased thermal stability of CoSi2 film in Ti capped Co/Si(100) system. Applied Physics Letters, 73 (16). 2302-2304 doi:10.1063/1.121804
Bae, Jong-Uk, Sohn, Dong Kyun, Park, Ji-Soo, Han, Chang Hee, Park, Jin Won, Kim, Yeong-Cheol, Kim, Jae Jeong (2001) A Study on Thermal Stability of CoSi2Employing Novel Fine-Grained Polycrystalline Silicon/CoSi2/Si (001) System. Japanese Journal of Applied Physics, 40. 6307-6310 doi:10.1143/jjap.40.6307
Lee, Byung Hak, Lee, Kee Sun, Sohn, Dong Kyun, Byun, Jeong Soo, Han, Chang Hee, Park, Ji-Soo, Han, Sang Beom, Park, Jin Woon (2000) In situ barrier formation using rapid thermal annealing of a tungsten nitride/polycrystalline silicon structure. Applied Physics Letters, 76 (18). 2538-2540 doi:10.1063/1.126401
Byun, Jeong Soo, Kim, Do‐Heyoung, Kim, Woo Shik, Kim, Hyeong Joon (1995) Epitaxial growth of CoSi2 layer on (100)Si and facet formation at the CoSi2/Si interface. Journal of Applied Physics, 78 (3). 1725-1730 doi:10.1063/1.360201
Bae, Jong-Uk, Sohn, Dong Kyun, Park, Ji-Soo, Lee, Byung Hak, Han, Chang Hee, Park, Jin Won (1999) Effect of pre-amorphization of polycrystalline silicon on agglomeration of TiSi2 in subquarter micron Si lines. Journal of Applied Physics, 86 (9). 4943-4948 doi:10.1063/1.371523
Han, Chang Hee, Sohn, Dong Kyun, Lee, Byung Hak, Park, Ji-Soo, Bae, Jong-Uk, Park, Jin Won (2000) Improvement of Gate Oxide Reliability for Direct Tungsten-Gate Using Denudation of WNx. Japanese Journal of Applied Physics, 39. doi:10.1143/jjap.39.l796
Park, Ji-Soo, Sohn, Dong Kyun, Bae, Jong-Uk, Park, Jin Won (1999) Suppression of Arsenic Loss by Phosphorus Co-Implantation in n+/p Shallow Junction Diffused from a CoSi2 Layer. Japanese Journal of Applied Physics, 38. doi:10.1143/jjap.38.l694
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