Sohn, Dong Kyun, Park, Ji-Soo, Lee, Byung Hak, Bae, Jong-Uk, Byun, Jeong Soo, Kim, Jae Jeong (1998) Formation of CoTi barrier and increased thermal stability of CoSi2 film in Ti capped Co/Si(100) system. Applied Physics Letters, 73 (16). 2302-2304 doi:10.1063/1.121804
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Formation of CoTi barrier and increased thermal stability of CoSi2 film in Ti capped Co/Si(100) system | ||
Journal | Applied Physics Letters | ||
Authors | Sohn, Dong Kyun | Author | |
Park, Ji-Soo | Author | ||
Lee, Byung Hak | Author | ||
Bae, Jong-Uk | Author | ||
Byun, Jeong Soo | Author | ||
Kim, Jae Jeong | Author | ||
Year | 1998 (October 19) | Volume | 73 |
Issue | 16 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.121804Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8522079 | Long-form Identifier | mindat:1:5:8522079:3 |
GUID | 0 | ||
Full Reference | Sohn, Dong Kyun, Park, Ji-Soo, Lee, Byung Hak, Bae, Jong-Uk, Byun, Jeong Soo, Kim, Jae Jeong (1998) Formation of CoTi barrier and increased thermal stability of CoSi2 film in Ti capped Co/Si(100) system. Applied Physics Letters, 73 (16). 2302-2304 doi:10.1063/1.121804 | ||
Plain Text | Sohn, Dong Kyun, Park, Ji-Soo, Lee, Byung Hak, Bae, Jong-Uk, Byun, Jeong Soo, Kim, Jae Jeong (1998) Formation of CoTi barrier and increased thermal stability of CoSi2 film in Ti capped Co/Si(100) system. Applied Physics Letters, 73 (16). 2302-2304 doi:10.1063/1.121804 | ||
In | (1998, October) Applied Physics Letters Vol. 73 (16) AIP Publishing |
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