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Zhang, Jun-Ying, Lim, Boon, Boyd, Ian W., Dusastre, Vincent (1998) Characteristics of high quality tantalum oxide films deposited by photoinduced chemical vapor deposition. Applied Physics Letters, 73 (16). 2299-2301 doi:10.1063/1.121803

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Reference TypeJournal (article/letter/editorial)
TitleCharacteristics of high quality tantalum oxide films deposited by photoinduced chemical vapor deposition
JournalApplied Physics Letters
AuthorsZhang, Jun-YingAuthor
Lim, BoonAuthor
Boyd, Ian W.Author
Dusastre, VincentAuthor
Year1998 (October 19)Volume73
Issue16
PublisherAIP Publishing
DOIdoi:10.1063/1.121803Search in ResearchGate
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Mindat Ref. ID8522078Long-form Identifiermindat:1:5:8522078:4
GUID0
Full ReferenceZhang, Jun-Ying, Lim, Boon, Boyd, Ian W., Dusastre, Vincent (1998) Characteristics of high quality tantalum oxide films deposited by photoinduced chemical vapor deposition. Applied Physics Letters, 73 (16). 2299-2301 doi:10.1063/1.121803
Plain TextZhang, Jun-Ying, Lim, Boon, Boyd, Ian W., Dusastre, Vincent (1998) Characteristics of high quality tantalum oxide films deposited by photoinduced chemical vapor deposition. Applied Physics Letters, 73 (16). 2299-2301 doi:10.1063/1.121803
In(1998, October) Applied Physics Letters Vol. 73 (16) AIP Publishing

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Zhang, Jun-Ying, Boyd, Ian W. (2000) Ultrathin high-quality tantalum pentoxide films grown by photoinduced chemical vapor deposition. Applied Physics Letters, 77 (22). 3574-3576 doi:10.1063/1.1328051
Zhang, Jun-Ying, Boyd, Ian W, Dusastre, Vincent, Williams, David E (1999) Ultraviolet annealing of tantalum oxide films grown by photo-induced chemical vapour deposition. Journal of Physics D: Applied Physics, 32. doi:10.1088/0022-3727/32/19/101
Zhang, Jun-Ying, Bie, Li-Jian, Boyd, Ian W. (1998) Formation of High Quality Tantalum Oxide Thin Films at 400°C by 172 nm Radiation. Japanese Journal of Applied Physics, 37. doi:10.1143/jjap.37.l27
Zhang, Jun-Ying, Lim, Boon, Boyd, Ian W (2000) Deposition and annealing of tantalum pentoxide films using 172 nm excimer lamp. Applied Surface Science, 154. 382-386 doi:10.1016/s0169-4332(99)00387-6
Zhang, Jun-Ying, Boyd, Ian W (2000) Thin tantalum and tantalum oxide films grown by pulsed laser deposition. Applied Surface Science, 168. 234-238 doi:10.1016/s0169-4332(00)00605-x
Craciun, V., Elders, J., Gardeniers, J. G. E., Boyd, Ian W. (1994) Characteristics of high quality ZnO thin films deposited by pulsed laser deposition. Applied Physics Letters, 65 (23). 2963-2965 doi:10.1063/1.112478
Zhang, Jun-Ying, Boyd, Ian W (2002) Structural and electrical properties of tantalum oxide films grown by photo-assisted pulsed laser deposition. Applied Surface Science, 186. 40-44 doi:10.1016/s0169-4332(01)00752-8
Zhang, Wei, Wang, Xiaoru, Boyd, Ian W. (1998) Incongruent transfer related to surface segregation in pulsed-laser-deposited La–Ca–Mn–O films. Applied Physics Letters, 73 (19). 2745-2747 doi:10.1063/1.122577
Kaliwoh, Never, Zhang, Jun-Ying, Boyd, Ian W. (2002) Characterisation of TiO2 deposited by photo-induced chemical vapour deposition. Applied Surface Science, 186. 241-245 doi:10.1016/s0169-4332(01)00600-6
Zhang, W. J., Jiang, X., Matsumoto, S. (2001) High-quality, faceted cubic boron nitride films grown by chemical vapor deposition. Applied Physics Letters, 79 (27). 4530-4532 doi:10.1063/1.1428762
Zhang, Jun-Ying, Fang, Qi, Boyd, Ian W. (1999) Growth of tantalum pentoxide film by pulsed laser deposition. Applied Surface Science, 138. 320-324 doi:10.1016/s0169-4332(98)00413-9
 
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