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Kim, S. S., Chang, H. Y., Chang, C. S., Yoon, N. S. (2000) Antenna configuration for uniform large-area inductively coupled plasma production. Applied Physics Letters, 77 (4). 492-494 doi:10.1063/1.127021

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Reference TypeJournal (article/letter/editorial)
TitleAntenna configuration for uniform large-area inductively coupled plasma production
JournalApplied Physics Letters
AuthorsKim, S. S.Author
Chang, H. Y.Author
Chang, C. S.Author
Yoon, N. S.Author
Year2000 (July 24)Volume77
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.127021Search in ResearchGate
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Mindat Ref. ID8528111Long-form Identifiermindat:1:5:8528111:0
GUID0
Full ReferenceKim, S. S., Chang, H. Y., Chang, C. S., Yoon, N. S. (2000) Antenna configuration for uniform large-area inductively coupled plasma production. Applied Physics Letters, 77 (4). 492-494 doi:10.1063/1.127021
Plain TextKim, S. S., Chang, H. Y., Chang, C. S., Yoon, N. S. (2000) Antenna configuration for uniform large-area inductively coupled plasma production. Applied Physics Letters, 77 (4). 492-494 doi:10.1063/1.127021
In(2000, July) Applied Physics Letters Vol. 77 (4) AIP Publishing

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Yoon, N. S., Kim, S. S., Chang, C. S., Choi, Duk-In (1996) One-dimensional solution for electron heating in an inductively coupled plasma discharge. Physical Review E, 54 (1) 757-767 doi:10.1103/physreve.54.757
Seo, B. H., You, S. J., Kim, J. H., Seong, D. J., Chang, H. Y. (2013) On anomalous temporal evolution of gas pressure in inductively coupled plasma. Applied Physics Letters, 102 (13). 134104pp. doi:10.1063/1.4798587
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Bai, K. H., Chang, H. Y., Kwon, G. C., Kim, H. S., Kim, J. S. (2007) Highly Selective SiO2Etching in Low-Electron-Temperature Inductively Coupled Plasma. Japanese Journal of Applied Physics, 46 (6) 3602-3604 doi:10.1143/jjap.46.3602
Bai, K. H., Lee, D. S., Chang, H. Y., Uhm, H. S. (2002) Control and analysis of ion species in N2 inductively coupled plasma with inert gas mixing. Applied Physics Letters, 80 (21). 3907-3909 doi:10.1063/1.1479452
Kwon, D. C., Chang, W. S., Park, M., You, D. H., Song, M. Y., You, S. J., Im, Y. H., Yoon, J.-S. (2011) A self-consistent global model of solenoidal-type inductively coupled plasma discharges including the effects of radio-frequency bias power. Journal of Applied Physics, 109 (7). 73311pp. doi:10.1063/1.3572264
Kim, K. N., Jung, S. J., Lee, Y. J., Yeom, G. Y., Lee, S. H., Lee, J. K. (2005) Low-impedance internal linear inductive antenna for large-area flat panel display plasma processing. Journal of Applied Physics, 97 (6). 63302pp. doi:10.1063/1.1861136
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Kim, T. J., Yoon, J. J., Byun, J. S., Hwang, S. Y., Aspnes, D. E., Shin, S. H., Song, J. D., Liang, C.-T., Chang, Y.-C., Barange, N. S., Kim, J. Y., Kim, Y. D. (2013) Interband transitions and dielectric functions of InGaSb alloys. Applied Physics Letters, 102 (10). 102109pp. doi:10.1063/1.4795622
Xiao, S. Q., Xu, S., Zhou, H. P., Wei, D. Y., Huang, S. Y., Xu, L. X., Sern, C. C., Guo, Y. N., Khan, S. (2012) Amorphous/crystalline silicon heterojunction solar cells via remote inductively coupled plasma processing. Applied Physics Letters, 100 (23). 233902pp. doi:10.1063/1.4721642
 
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