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Sarkar, D. K., Desbiens, E., El Khakani, M. A. (2002) High-k titanium silicate dielectric thin films grown by pulsed-laser deposition. Applied Physics Letters, 80 (2). 294-296 doi:10.1063/1.1435072

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Reference TypeJournal (article/letter/editorial)
TitleHigh-k titanium silicate dielectric thin films grown by pulsed-laser deposition
JournalApplied Physics Letters
AuthorsSarkar, D. K.Author
Desbiens, E.Author
El Khakani, M. A.Author
Year2002 (January 14)Volume80
Issue2
PublisherAIP Publishing
DOIdoi:10.1063/1.1435072Search in ResearchGate
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Mindat Ref. ID8532022Long-form Identifiermindat:1:5:8532022:4
GUID0
Full ReferenceSarkar, D. K., Desbiens, E., El Khakani, M. A. (2002) High-k titanium silicate dielectric thin films grown by pulsed-laser deposition. Applied Physics Letters, 80 (2). 294-296 doi:10.1063/1.1435072
Plain TextSarkar, D. K., Desbiens, E., El Khakani, M. A. (2002) High-k titanium silicate dielectric thin films grown by pulsed-laser deposition. Applied Physics Letters, 80 (2). 294-296 doi:10.1063/1.1435072
In(2002, January) Applied Physics Letters Vol. 80 (2) AIP Publishing

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Brassard, D., El Khakani, M. A. (2005) Pulsed-laser deposition of high-k titanium silicate thin films. Journal of Applied Physics, 98 (5). 54912pp. doi:10.1063/1.2039274
Desbiens, E., El Khakani, M. A. (2003) Growth of high-ksilicon oxynitride thin films by means of a pulsed laser deposition-atomic nitrogen plasma source hybrid system for gate dielectric applications. Journal of Applied Physics, 94 (9). 5969-5975 doi:10.1063/1.1616636
El Khakani, M. A., Chaker, M., Gat, E. (1996) Pulsed laser deposition of highly conductive iridium oxide thin films. Applied Physics Letters, 69 (14). 2027-2029 doi:10.1063/1.116868
Brassard, D., Sarkar, D. K., El Khakani, M. A., Ouellet, L. (2004) Tuning the electrical resistivity of pulsed laser deposited TiSiOx thin films from highly insulating to conductive behaviors. Applied Physics Letters, 84 (13). 2304-2306 doi:10.1063/1.1688999
Zhai, H. Y., Christen, H. M., Cantoni, C., Goyal, A., Lowndes, D. H. (2002) Epitaxial titanium diboride films grown by pulsed-laser deposition. Applied Physics Letters, 80 (11). 1963-1965 doi:10.1063/1.1461869
Brassard, D., El Khakani, M. A. (2008) Thermal behavior of the microstructure and the electrical properties of magnetron-sputtered high-k titanium silicate thin films. Journal of Applied Physics, 103 (11). 114110pp. doi:10.1063/1.2937241
Brassard, D., El Khakani, M. A., Ouellet, L. (2007) Substrate biasing effect on the electrical properties of magnetron-sputtered high-k titanium silicate thin films. Journal of Applied Physics, 102 (3). 34106pp. doi:10.1063/1.2759196
Brassard, D., El Khakani, M. A. (2003) Dielectric properties of amorphous hydrogenated silicon carbide thin films grown by plasma-enhanced chemical vapor deposition. Journal of Applied Physics, 93 (7). 4066-4071 doi:10.1063/1.1555676
Si, W., Cruz, E. M., Johnson, P. D., Barnes, P. W., Woodward, P., Ramirez, A. P. (2002) Epitaxial thin films of the giant-dielectric-constant material CaCu3Ti4O12 grown by pulsed-laser deposition. Applied Physics Letters, 81 (11). 2056-2058 doi:10.1063/1.1506951
Sarkar, D. K., Brassard, D., El Khakani, M. A., Ouellet, L. (2005) Single-electron tunneling at room temperature in TixSi1−xO2 nanocomposite thin films. Applied Physics Letters, 87 (25). 253108pp. doi:10.1063/1.2147729
Satyalakshmi, K. M., Alexe, M., Pignolet, A., Zakharov, N. D., Harnagea, C., Senz, S., Hesse, D. (1999) BaBi4Ti4O15 ferroelectric thin films grown by pulsed laser deposition. Applied Physics Letters, 74 (4). 603-605 doi:10.1063/1.123159
 
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