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Brassard, D., Sarkar, D. K., El Khakani, M. A., Ouellet, L. (2004) Tuning the electrical resistivity of pulsed laser deposited TiSiOx thin films from highly insulating to conductive behaviors. Applied Physics Letters, 84 (13). 2304-2306 doi:10.1063/1.1688999

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Reference TypeJournal (article/letter/editorial)
TitleTuning the electrical resistivity of pulsed laser deposited TiSiOx thin films from highly insulating to conductive behaviors
JournalApplied Physics Letters
AuthorsBrassard, D.Author
Sarkar, D. K.Author
El Khakani, M. A.Author
Ouellet, L.Author
Year2004 (March 29)Volume84
Issue13
PublisherAIP Publishing
DOIdoi:10.1063/1.1688999Search in ResearchGate
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Mindat Ref. ID8538175Long-form Identifiermindat:1:5:8538175:7
GUID0
Full ReferenceBrassard, D., Sarkar, D. K., El Khakani, M. A., Ouellet, L. (2004) Tuning the electrical resistivity of pulsed laser deposited TiSiOx thin films from highly insulating to conductive behaviors. Applied Physics Letters, 84 (13). 2304-2306 doi:10.1063/1.1688999
Plain TextBrassard, D., Sarkar, D. K., El Khakani, M. A., Ouellet, L. (2004) Tuning the electrical resistivity of pulsed laser deposited TiSiOx thin films from highly insulating to conductive behaviors. Applied Physics Letters, 84 (13). 2304-2306 doi:10.1063/1.1688999
In(2004, March) Applied Physics Letters Vol. 84 (13) AIP Publishing


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