Chung, Deuk-Seok, Park, S. H., Lee, H. W., Choi, J. H., Cha, S. N., Kim, J. W., Jang, J. E., Min, K. W., Cho, S. H., Yoon, M. J., Lee, J. S., Lee, C. K., Yoo, J. H., Kim, Jong-Min, Jung, J. E., Jin, Y. W., Park, Y. J., You, J. B. (2002) Carbon nanotube electron emitters with a gated structure using backside exposure processes. Applied Physics Letters, 80 (21). 4045-4047 doi:10.1063/1.1480104
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Carbon nanotube electron emitters with a gated structure using backside exposure processes | ||
Journal | Applied Physics Letters | ||
Authors | Chung, Deuk-Seok | Author | |
Park, S. H. | Author | ||
Lee, H. W. | Author | ||
Choi, J. H. | Author | ||
Cha, S. N. | Author | ||
Kim, J. W. | Author | ||
Jang, J. E. | Author | ||
Min, K. W. | Author | ||
Cho, S. H. | Author | ||
Yoon, M. J. | Author | ||
Lee, J. S. | Author | ||
Lee, C. K. | Author | ||
Yoo, J. H. | Author | ||
Kim, Jong-Min | Author | ||
Jung, J. E. | Author | ||
Jin, Y. W. | Author | ||
Park, Y. J. | Author | ||
You, J. B. | Author | ||
Year | 2002 (May 27) | Volume | 80 |
Issue | 21 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.1480104Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8532096 | Long-form Identifier | mindat:1:5:8532096:9 |
GUID | 0 | ||
Full Reference | Chung, Deuk-Seok, Park, S. H., Lee, H. W., Choi, J. H., Cha, S. N., Kim, J. W., Jang, J. E., Min, K. W., Cho, S. H., Yoon, M. J., Lee, J. S., Lee, C. K., Yoo, J. H., Kim, Jong-Min, Jung, J. E., Jin, Y. W., Park, Y. J., You, J. B. (2002) Carbon nanotube electron emitters with a gated structure using backside exposure processes. Applied Physics Letters, 80 (21). 4045-4047 doi:10.1063/1.1480104 | ||
Plain Text | Chung, Deuk-Seok, Park, S. H., Lee, H. W., Choi, J. H., Cha, S. N., Kim, J. W., Jang, J. E., Min, K. W., Cho, S. H., Yoon, M. J., Lee, J. S., Lee, C. K., Yoo, J. H., Kim, Jong-Min, Jung, J. E., Jin, Y. W., Park, Y. J., You, J. B. (2002) Carbon nanotube electron emitters with a gated structure using backside exposure processes. Applied Physics Letters, 80 (21). 4045-4047 doi:10.1063/1.1480104 | ||
In | (2002, May) Applied Physics Letters Vol. 80 (21) AIP Publishing |
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