Kamohara, Toshihiro, Akiyama, Morito, Ueno, Naohiro, Sakamoto, Michiru, Kano, Kazuhiko, Teshigahara, Akihiko, Kawahara, Nobuaki, Kuwano, Noriyuki (2006) Influence of sputtering pressure on polarity distribution of aluminum nitride thin films. Applied Physics Letters, 89 (24). 243507pp. doi:10.1063/1.2405849
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Influence of sputtering pressure on polarity distribution of aluminum nitride thin films | ||
| Journal | Applied Physics Letters | ||
| Authors | Kamohara, Toshihiro | Author | |
| Akiyama, Morito | Author | ||
| Ueno, Naohiro | Author | ||
| Sakamoto, Michiru | Author | ||
| Kano, Kazuhiko | Author | ||
| Teshigahara, Akihiko | Author | ||
| Kawahara, Nobuaki | Author | ||
| Kuwano, Noriyuki | Author | ||
| Year | 2006 (December 11) | Volume | 89 |
| Issue | 24 | ||
| Publisher | AIP Publishing | ||
| DOI | doi:10.1063/1.2405849Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 8551392 | Long-form Identifier | mindat:1:5:8551392:1 |
| GUID | 0 | ||
| Full Reference | Kamohara, Toshihiro, Akiyama, Morito, Ueno, Naohiro, Sakamoto, Michiru, Kano, Kazuhiko, Teshigahara, Akihiko, Kawahara, Nobuaki, Kuwano, Noriyuki (2006) Influence of sputtering pressure on polarity distribution of aluminum nitride thin films. Applied Physics Letters, 89 (24). 243507pp. doi:10.1063/1.2405849 | ||
| Plain Text | Kamohara, Toshihiro, Akiyama, Morito, Ueno, Naohiro, Sakamoto, Michiru, Kano, Kazuhiko, Teshigahara, Akihiko, Kawahara, Nobuaki, Kuwano, Noriyuki (2006) Influence of sputtering pressure on polarity distribution of aluminum nitride thin films. Applied Physics Letters, 89 (24). 243507pp. doi:10.1063/1.2405849 | ||
| In | (2006, December) Applied Physics Letters Vol. 89 (24) AIP Publishing | ||
See Also
These are possibly similar items as determined by title/reference text matching only.
