Cochrane, C. J., Lenahan, P. M., Campbell, J. P., Bersuker, G., Neugroschel, A. (2007) Observation of negative bias stressing interface trapping centers in metal gate hafnium oxide field effect transistors using spin dependent recombination. Applied Physics Letters, 90 (12). 123502pp. doi:10.1063/1.2715141
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Observation of negative bias stressing interface trapping centers in metal gate hafnium oxide field effect transistors using spin dependent recombination | ||
Journal | Applied Physics Letters | ||
Authors | Cochrane, C. J. | Author | |
Lenahan, P. M. | Author | ||
Campbell, J. P. | Author | ||
Bersuker, G. | Author | ||
Neugroschel, A. | Author | ||
Year | 2007 (March 19) | Volume | 90 |
Issue | 12 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.2715141Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8553019 | Long-form Identifier | mindat:1:5:8553019:5 |
GUID | 0 | ||
Full Reference | Cochrane, C. J., Lenahan, P. M., Campbell, J. P., Bersuker, G., Neugroschel, A. (2007) Observation of negative bias stressing interface trapping centers in metal gate hafnium oxide field effect transistors using spin dependent recombination. Applied Physics Letters, 90 (12). 123502pp. doi:10.1063/1.2715141 | ||
Plain Text | Cochrane, C. J., Lenahan, P. M., Campbell, J. P., Bersuker, G., Neugroschel, A. (2007) Observation of negative bias stressing interface trapping centers in metal gate hafnium oxide field effect transistors using spin dependent recombination. Applied Physics Letters, 90 (12). 123502pp. doi:10.1063/1.2715141 | ||
In | (2007, March) Applied Physics Letters Vol. 90 (12) AIP Publishing |
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