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Wong, K. M., Chim, W. K., Ang, K. W., Yeo, Y. C. (2007) Spatial distribution of interface trap density in strained channel transistors using the spread of the differential capacitance characteristics in scanning capacitance microscopy measurements. Applied Physics Letters, 90 (15). 153507pp. doi:10.1063/1.2721868

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Reference TypeJournal (article/letter/editorial)
TitleSpatial distribution of interface trap density in strained channel transistors using the spread of the differential capacitance characteristics in scanning capacitance microscopy measurements
JournalApplied Physics Letters
AuthorsWong, K. M.Author
Chim, W. K.Author
Ang, K. W.Author
Yeo, Y. C.Author
Year2007 (April 9)Volume90
Issue15
PublisherAIP Publishing
DOIdoi:10.1063/1.2721868Search in ResearchGate
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Mindat Ref. ID8553399Long-form Identifiermindat:1:5:8553399:8
GUID0
Full ReferenceWong, K. M., Chim, W. K., Ang, K. W., Yeo, Y. C. (2007) Spatial distribution of interface trap density in strained channel transistors using the spread of the differential capacitance characteristics in scanning capacitance microscopy measurements. Applied Physics Letters, 90 (15). 153507pp. doi:10.1063/1.2721868
Plain TextWong, K. M., Chim, W. K., Ang, K. W., Yeo, Y. C. (2007) Spatial distribution of interface trap density in strained channel transistors using the spread of the differential capacitance characteristics in scanning capacitance microscopy measurements. Applied Physics Letters, 90 (15). 153507pp. doi:10.1063/1.2721868
In(2007, April) Applied Physics Letters Vol. 90 (15) AIP Publishing


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