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Yang, Z. C., Huang, A. P., Yan, L., Xiao, Z. S., Zhang, X. W., Chu, Paul K., Wang, W. W. (2009) Role of interface dipole in metal gate/high-k effective work function modulation by aluminum incorporation. Applied Physics Letters, 94 (25). 252905pp. doi:10.1063/1.3159830

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Reference TypeJournal (article/letter/editorial)
TitleRole of interface dipole in metal gate/high-k effective work function modulation by aluminum incorporation
JournalApplied Physics Letters
AuthorsYang, Z. C.Author
Huang, A. P.Author
Yan, L.Author
Xiao, Z. S.Author
Zhang, X. W.Author
Chu, Paul K.Author
Wang, W. W.Author
Year2009 (June 22)Volume94
Issue25
PublisherAIP Publishing
DOIdoi:10.1063/1.3159830Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8575255Long-form Identifiermindat:1:5:8575255:7
GUID0
Full ReferenceYang, Z. C., Huang, A. P., Yan, L., Xiao, Z. S., Zhang, X. W., Chu, Paul K., Wang, W. W. (2009) Role of interface dipole in metal gate/high-k effective work function modulation by aluminum incorporation. Applied Physics Letters, 94 (25). 252905pp. doi:10.1063/1.3159830
Plain TextYang, Z. C., Huang, A. P., Yan, L., Xiao, Z. S., Zhang, X. W., Chu, Paul K., Wang, W. W. (2009) Role of interface dipole in metal gate/high-k effective work function modulation by aluminum incorporation. Applied Physics Letters, 94 (25). 252905pp. doi:10.1063/1.3159830
In(2009, June) Applied Physics Letters Vol. 94 (25) AIP Publishing

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