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Yu, Chong Qi, Wang, Hui (2010) Bias-induced offset effect overlapped on bipolar-resistance effect based on Co/SiO2/Si structure. Applied Physics Letters, 97 (4). 41105pp. doi:10.1063/1.3469932

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Reference TypeJournal (article/letter/editorial)
TitleBias-induced offset effect overlapped on bipolar-resistance effect based on Co/SiO2/Si structure
JournalApplied Physics Letters
AuthorsYu, Chong QiAuthor
Wang, HuiAuthor
Year2010 (July 26)Volume97
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.3469932Search in ResearchGate
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Mindat Ref. ID8589848Long-form Identifiermindat:1:5:8589848:8
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Full ReferenceYu, Chong Qi, Wang, Hui (2010) Bias-induced offset effect overlapped on bipolar-resistance effect based on Co/SiO2/Si structure. Applied Physics Letters, 97 (4). 41105pp. doi:10.1063/1.3469932
Plain TextYu, Chong Qi, Wang, Hui (2010) Bias-induced offset effect overlapped on bipolar-resistance effect based on Co/SiO2/Si structure. Applied Physics Letters, 97 (4). 41105pp. doi:10.1063/1.3469932
In(2010, July) Applied Physics Letters Vol. 97 (4) AIP Publishing

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