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Li, W., Pei, D., Guo, X., Cheng, M. K., Lee, S., Lin, Q., King, S. W., Shohet, J. L. (2016) Effects of cesium ion-implantation on mechanical and electrical properties of organosilicate low-k films. Applied Physics Letters, 108 (20). 202901pp. doi:10.1063/1.4950717

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Reference TypeJournal (article/letter/editorial)
TitleEffects of cesium ion-implantation on mechanical and electrical properties of organosilicate low-k films
JournalApplied Physics Letters
AuthorsLi, W.Author
Pei, D.Author
Guo, X.Author
Cheng, M. K.Author
Lee, S.Author
Lin, Q.Author
King, S. W.Author
Shohet, J. L.Author
Year2016 (May 16)Volume108
Issue20
PublisherAIP Publishing
DOIdoi:10.1063/1.4950717Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8640400Long-form Identifiermindat:1:5:8640400:0
GUID0
Full ReferenceLi, W., Pei, D., Guo, X., Cheng, M. K., Lee, S., Lin, Q., King, S. W., Shohet, J. L. (2016) Effects of cesium ion-implantation on mechanical and electrical properties of organosilicate low-k films. Applied Physics Letters, 108 (20). 202901pp. doi:10.1063/1.4950717
Plain TextLi, W., Pei, D., Guo, X., Cheng, M. K., Lee, S., Lin, Q., King, S. W., Shohet, J. L. (2016) Effects of cesium ion-implantation on mechanical and electrical properties of organosilicate low-k films. Applied Physics Letters, 108 (20). 202901pp. doi:10.1063/1.4950717
In(2016, May) Applied Physics Letters Vol. 108 (20) AIP Publishing


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