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Loper, G.L., Suck-Salk, S.H., Tabat, M.D. (1989) UV laser etching processes for film layers used in silicon integrated circuits. Applied Surface Science, 36. 257-266 doi:10.1016/0169-4332(89)90921-5

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Reference TypeJournal (article/letter/editorial)
TitleUV laser etching processes for film layers used in silicon integrated circuits
JournalApplied Surface Science
AuthorsLoper, G.L.Author
Suck-Salk, S.H.Author
Tabat, M.D.Author
Year1989 (January)Volume36
PublisherElsevier BV
DOIdoi:10.1016/0169-4332(89)90921-5Search in ResearchGate
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Mindat Ref. ID9894611Long-form Identifiermindat:1:5:9894611:0
GUID0
Full ReferenceLoper, G.L., Suck-Salk, S.H., Tabat, M.D. (1989) UV laser etching processes for film layers used in silicon integrated circuits. Applied Surface Science, 36. 257-266 doi:10.1016/0169-4332(89)90921-5
Plain TextLoper, G.L., Suck-Salk, S.H., Tabat, M.D. (1989) UV laser etching processes for film layers used in silicon integrated circuits. Applied Surface Science, 36. 257-266 doi:10.1016/0169-4332(89)90921-5
In(n.d.) Applied Surface Science Vol. 36. Elsevier BV

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Mogyorósi, P. (1989) CW-laser induced chemical etching of thin silver and molybdenum films. Applied Surface Science, 36. 332-342 doi:10.1016/0169-4332(89)90928-8
Trundle, C., Brierley, C.J. (1989) Precursors for thin film oxides by photo-MOCVD. Applied Surface Science, 36. 102-118 doi:10.1016/0169-4332(89)90904-5
Stumpff, C., Sigmund, H. (1989) Selective crystallization of silicon layers without seeding and capping layer. Applied Surface Science, 36. 605-613 doi:10.1016/0169-4332(89)90956-2
(1989) Subject index. Applied Surface Science, 36. 689-703 doi:10.1016/0169-4332(89)90966-5
Burke, Rudolf R., Pomot, Claude (1989) Microwave multipolar plasma for etching and deposition. Applied Surface Science, 36. 267-277 doi:10.1016/0169-4332(89)90922-7
Baller, T.S., Dieleman, J. (1989) Nanosecond excimer laser-enhanced chemical etching. Applied Surface Science, 43. 409-415 doi:10.1016/0169-4332(89)90248-1
Eisele, I. (1989) Delta-type doping profiles in silicon. Applied Surface Science, 36. 39-51 doi:10.1016/0169-4332(89)90897-0
Klumpp, A., Sigmund, H. (1989) Deposition of high quality SiO2 layers from TEOS by excimer laser. Applied Surface Science, 36. 141-149 doi:10.1016/0169-4332(89)90907-0
(1989) Preface. Applied Surface Science, 36. doi:10.1016/0169-4332(89)90891-x
(1989) Editorial Board. Applied Surface Science, 36. doi:10.1016/0169-4332(89)90890-8
(1989) Conference organisation. Applied Surface Science, 36. doi:10.1016/0169-4332(89)90892-1
 
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